local ion density control using passive resonant antenna in an inductively coupled plasma with a bias electrode

In plasma discharges, capacitive coupling and inductive coupling are very important because it affects the discharge mechanism and electrical characteristics. In this work, we investigate the change in ion density and plasma characteristics by controlling the current flow between the bias electrode and the antenna. RF power is sequentially transmitted through a transmitting coil, a relay coil, and a receiving coil, and the receiving coil is connected to a bias plate and an antenna. The antenna and the bias electrode are parallel to each other, and the power flow between them is controlled by a vacuum variable capacitor. Ion density is experimentally measured at various RF powers and gas pressures. The work is discussed along with the relevant physical mechanism.