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Concentration Dependent Ionization Dynamics in Torr Pressure N2-NH3 CCPs

POSTER

Abstract

The formation of ions in moderate and high-pressure capacitively coupled plasma (CCP) discharges often involves multi-step processes where one species, generated by electron-neutral collisions, interacts further with other neutral species to form ions. Two such processes are the N2(a’)+N2(a’) -> N4+ + e- in N2 plasmas, and NH3+ + NH3 -> NH4+ + NH2 in NH3 plasmas. In torr pressure pure N2 and pure NH3 CCPs, these and similar processes result in N4+ and NH4+ being the predominant ion species. However, mixtures often have ionization processes that are different than their pure components. For example, addition of small amounts of NH3 to N2 significantly reduces the N4+ production mechanism due to the presence of competing inelastic loss and ionization processes at similar 7-10 eV energies that change the electron energy distribution function. Addition of NH3 to N2 gas results in the near complete absence of N4+ ions, greater presence of N2+ ions, and significant sub-RF-cycle fluctuations in NH3+ ion densities as these species are quickly converted to NH4+ in collisions with neutrals. In this work, these and other qualitative changes in ionization mechanism are explored as a function of concentration and pressure using a 1D fluid CCP model.

Presenters

  • Brett Scheiner

    Lam Research Corporation

Authors

  • Brett Scheiner

    Lam Research Corporation