Production of radio-frequency hybrid-discharge plasma using hydrogen gas for thin film preparation

A hybrid radio-frequency (RF) plasma with capacitive coupled plasma (CCP) with a hollow cathode and inductive coupled plasma (ICP) with a helical antenna has been produced in hydrogen gas. Characteristics of the hybrid RF plasma are measured by a tiny Langmuir probe in a fixed mid position between the RF powered electrode with ring-shaped hollow cathode and the grounded one. It is found that a RF voltage of the capacitive discharge is almost independent on input power of ICP. The hybrid RF plasma attains a high-density corresponding to ion density of order magnitude of 10¹⁰cm^-3 even under the condition of input power 50 W of CCP. The plasma density is strongly influenced by not a total input power but the input power of CCP. In conference, experimental data using methane and hydrogen mixture gases will be presented.