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Magnetrons and Multipactors

INVITED · HT1 · ID: 1531182

Presentations

  • Design of rotational RF magnetron sputtering plasma and its characteristics for target utilization saving resources

    ORAL · Invited

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    Publication: 1. Y.Ohtsu, K. Yasuda and J. Schulze, "Temporal evolution of the ion flux to the target in rotational RF multi-magnetron plasma", J. Vac. Sci. Technol. A, 40, 5, 053006(9pp)<br>2. K. Yasuda, Y.Ohtsu and J.Schulze, "Development of a cruciform radio-frequency closed magnetron sputtering source including four sectorial magnetron sputtering discharges for uniform target utilization", Vacuum 202(2022)111184(7pp)<br>3. Md. A. Hossain, Md. A. M. Patwary, Md. M. Rahman and Y. Ohtsu, "Properties of AZO thin films prepared by stationary and rotating RF magnetized plasma sputtering source", AIP Advances, 12, (2022), 015224-1-9<br>4. Y. Ohtsu, R. Tanaka and T. Nakashima, "Development of rotational maze-shaped RF magnetron plasma for successful target utilization and the thin film preparation", Jpn.J。Appl. Phys., Special Issue: Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials, 60, SA(2021), SAAB01-1-7<br>5. Y. Ohtsu, T. Nakashima, R. Tanaka and J. Schulze," Characteristics of a rotational windmill-shaped radio frequency magnetron sputtering plasma for effective target utilization", Vacuum, 181,(2020) 109593-1-10

    Presenters

    • Yasunori Otsu

      Saga University, Japan

    Authors

    • Yasunori Otsu

      Saga University, Japan

    • Md. Amzad Hossain

      Jashore University of Science and Technology

    • Julian Schulze

      Bochum University, Ruhr University Bochum, Germany, Ruhr-University Bochum

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  • A study of magnetic field effect in low pressure capacitively coupled plasmas

    ORAL · Invited

    –

    Presenters

    • Sathya S Ganta

      Applied Materials, Inc., Applied Materials Inc, Applied Materials

    Authors

    • Sathya S Ganta

      Applied Materials, Inc., Applied Materials Inc, Applied Materials

    • Kallol Bera

      Applied Materials, Inc., Applied Materials

    • Shahid Rauf

      Applied Materials, Inc., Applied Materials

    • Igor D Kaganovich

      Princeton Plasma Physics Laboratory

    • Alexander V Khrabrov

      Princeton Plasma Physics Laboratory

    • Andrew Tasman T Powis

      Princeton Plasma Physics Laboratory

    • Dmytro Sydorenko

      University of Alberta, University of Alberta, Edmonton, Alberta T6G 2E1, Canada

    • Liang Xu

      Soochow University, China

    View abstract →