Plasma Diagnostics and Etching
FOCUS · GW1 · ID: 1531135
Presentations
-
Probing low temperature plasmas with structured light beams and derivative spectroscopy
ORAL · Invited
–
Presenters
-
Ivan Romadanov
Princeton Plasma Physics Laboratory
Authors
-
Ivan Romadanov
Princeton Plasma Physics Laboratory
-
-
Plasma-based pseudo-wet mechanism for cryogenic SiO<sub>2</sub> etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis
ORAL
–
Presenters
-
Shih-Nan Hsiao
Nagoya university
Authors
-
Shih-Nan Hsiao
Nagoya university
-
Makoto Sekine
Nagoya University
-
Takayoshi Tsutsumi
Nagoya University
-
Kenji Ishikawa
Nagoya University, Japan
-
Manabu Iwata
Tokyo Electron Ltd.
-
Maju Tomura
Tokyo Electron Miyagi Ltd., Tokyo Electron Ltd.
-
Yuki Iijima
Tokyo Electron Ltd.
-
Taku Gohira
Tokyo Electron Ltd.
-
Keiichi Matsushima
Tokyo Electron Ltd.
-
Yoshinobu Ohya
Tokyo Electron Ltd.
-
Masaru Hori
Nagoya University
-
-
Automatic Optimization of Reaction Mechanisms in Simulations of High Aspect Ratio Plasma Etching
ORAL
–
Presenters
-
Florian Krueger
University of Michigan
Authors
-
Florian Krueger
University of Michigan
-
Du Zhang
TEL Technology Center, America, LLC
-
Pingshan Luan
TEL Technology Center, America, LLC, TEL TECHNOLOGY CENTER, AMERICA, LLC
-
Minsoek Oh
TEL Technology Center, America, LLC
-
Minjoon Park
TEL Technology Center, America, LLC
-
Andrew Metz
TEL Technology Center, America, LLC
-
Mark J Kushner
University of Michigan
-
-
State-of-the-art plasma etch process and technologies for high aspect ratio pattern
ORAL · Invited
–
Publication: [1] Y. Kihara, et al., VLSI symposium Technology and Circuit, T3-2, 2023.
Presenters
-
Maju Tomura
Tokyo Electron Miyagi Ltd., Tokyo Electron Ltd.
Authors
-
Maju Tomura
Tokyo Electron Miyagi Ltd., Tokyo Electron Ltd.
-
MASANOBU HONDA
Tokyo Electron Miyagi Ltd.
-
YOSHIHIDE KIHARA
Tokyo Electron Miyagi Ltd.
-