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Experimental study on arcing initiation mechanism based on electric current and optical emission measurement in a capacitively coupled plasma

ORAL

Abstract

Arcing has attracted great interest in both industrial and academic fields for over 120 years, as it induces severe damage to the material surface regardless of the materials involved and originates from multi-dimensional scale dynamics. However, its mechanism, especially under a moderate-density (1009–1011 cm-3) plasma environment, has yet to be fully understood. This presentation provides an experimental study on the initiation mechanism generated on an arcing-inducing probe under a radio-frequency capacitively coupled plasma environment. We employed multi-diagnostic methods, including voltage/current probes, an ultra-high-speed camera, and an optical emission spectrometer. We found that the light emission from the arcing spot corresponds to the arcing current induced by thermofield electron emission. Furthermore, metal evaporators were observed in the optical emission spectra, indicating a high temperature on the arcing spot sufficient for vaporization. Based on these findings, we reveal that ionization collisions between emitted electrons and evaporated atoms initiate an electron avalanche near the emission spot, leading to the initiation of arcing.

Presenters

  • SiJun Kim

    Chungnam Natl Univ

Authors

  • SiJun Kim

    Chungnam Natl Univ

  • Chulhee Cho

    Chungnam Natl Univ

  • Minsu Choi

    Chungnam Natl Univ

  • Youngseok Lee

    Chungnam Natl Univ

  • Inho Seong

    Chungnam Natl Univ

  • Wonnyoung Jeong

    Chungnam Natl Univ

  • Byeongyeop Choi

    Chungnam Natl Univ

  • Youbin Seol

    Chungnam Natl Univ

  • Sanghoo Park

    Korea Advanced Institute of Science and Technology (KAIST)

  • Daewoong Kim

    Korea Institute of Machinery and Materials (KIMM)

  • Shin Jae You

    Chungnam Natl Univ, Department of Physics, Chungnam National University