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Plasma Deposition & Damage

FOCUS · FT3 · ID: 1530570

Presentations

  • In-situ Diagnostics for Plasma Enhanced ALD and CVD

    ORAL · Invited

    –

    Presenters

    • Jianping Zhao

      Tokyo Electron America

    Authors

    • Jianping Zhao

      Tokyo Electron America

    • John Carroll

      Tokyo Electron America

    • Peter L Ventzek

      Tokyo Electron America

    • Charles Schlechte

      Tokyo Electron America

    • Tsung-Hsuan Yang

      University of Texas at Austin

    • Ting-Ya Wang

      University of Texas at Austin

    • Samuel Johnson

      University of Texas at Austin

    • John G Ekerdt

      University of Texas at Austin

    • Gyeong S Hwang

      University of Texas at Austin

    View abstract →

  • Development of Yttrium Oxide Film Deposition Method using Low-temperature Microwave Excited Atmospheric Pressure Plasma Jet

    ORAL

    –

    Publication: [1] Y. Kobayashi et al., "Current Status and Needs in the Future of Ceramics Used for Semiconductor Production Equipment", Proc. 37th Seminar on High-Temperature Ceramics, K. Matsuhiro, Ed., July 19, 2005 (Osaka, Japan), Japan Ceramics Society, 2005, p 1-7 (in Japanese)<br> [2] M. Kindelmann et al., "Erosion behavior of Y2O3 in fluorine-based etching plasmas: Orientation dependency and reaction layer formation," Journal of the American Ceramic Society, vol. 104, no. 3, pp. 1465–1474, Mar. 2021, doi: 10.1111/jace.17556.

    Presenters

    • Bat-Orgil Erdenezaya

      Kanazawa University

    Authors

    • Bat-Orgil Erdenezaya

      Kanazawa University

    • Hirochika Uratani

      Division of Electrical Engineering and Computer Science, Kanazawa University, Ishikawa, Japan

    • Ruka Yazawa

      Nanomaterials Research Institute, Kanazawa University, Ishikawa, Japan

    • Md. Shahiduzzaman

      Nanomaterials Research Institute, Kanazawa University, Ishikawa, Japan

    • Tetsuya Taima

      Nanomaterials Research Institute, Kanazawa University, Ishikawa, Japan

    • Yusuke Nakano

      Division of Electrical Engineering and Computer Science, Kanazawa University, Ishikawa, Japan

    • Yasunori Tanaka

      Division of Electrical Engineering and Computer Science, Kanazawa University, Ishikawa, Japan

    • Tatsuo Ishijima

      Division of Electrical Engineering and Computer Science, Kanazawa University, Ishikawa, Japan

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  • Understanding and controlling the role of ions during plasma-enhanced ALD and ALE

    ORAL · Invited

    –

    Publication: Foundations of atomic-level plasma processing in nanoelectronics, K. Arts, S. Hamaguchi, T. Ito, K. Karahashi, H.C.M. Knoops, A.J.M. Mackus, W.M.M. Kessels, Plasma Sources Sci. Technol. 31, 103002 (2022).

    Presenters

    • Erwin Kessels

      Eindhoven University of Technology

    Authors

    • Erwin Kessels

      Eindhoven University of Technology

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  • A Study on the Hydrogen Plasma induced material damage for EUV lithography Components and Material evaluation

    ORAL

    –

    Presenters

    • Eun-Seok Choe

      Korea Research Institute of Standards and Science

    Authors

    • Eun-Seok Choe

      Korea Research Institute of Standards and Science

    • Seungwook Choi

      UST (University of Science and Technology)

    • Ansoon Kim

      UST (University of Science and Technology)

    • Kwan-Yong Kim

      Korea Research Institute of Standards and Science

    • HeeJung Yeom

      Korea Research Institute of Standards and Science

    • Min Young Yoon

      Korea Research Institute of Standards and science

    • Seongwan Hong

      Korea Research Institute of Standards and Science

    • Dong-Wook Kim

      Chungnam National University

    • Jung Hyung Kim

      Korea Research Institute of Standards and Science

    • Hyo-Chang Lee

      Korea Aerospace University

    View abstract →