Opportunities for Plasma Science and Engineering in Microelectronics Fabrication
FOCUS · FM1 · ID: 1538870
Presentations
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Introduction
ORAL
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Presenters
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Mark J Kushner
University of Michigan
Authors
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Mark J Kushner
University of Michigan
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Steven Shannon
North Carolina State University
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Overview of Opportunities for Plasma Science and Engineering in Microelectronics Fabrication
ORAL · Invited
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Presenters
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David B Graves
Princeton University
Authors
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David B Graves
Princeton University
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The Future Challenges of Semiconductor Processing
ORAL · Invited
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Presenters
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Aaron Wilson
Micron Technology Inc.
Authors
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Aaron Wilson
Micron Technology Inc.
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Lunch
COFFEE_KLATCH
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Opportunities for Plasma Science and Engineering in Micro Electronics: The Grand Challenges Facing Equipment Manufacturers
ORAL · Invited
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Presenters
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Alex Paterson
Lam Research
Authors
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Alex Paterson
Lam Research
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Overcoming Challenges in Semiconductor Manufacturing: Bridging Engineering and Science
ORAL · Invited
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Presenters
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Sang Ki Nam
Samsung Electronics
Authors
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Sang Ki Nam
Samsung Electronics
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Sang Wuk Park
Samsung Electronics
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Bong Jin Kuh
Samsung Electronics
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Doug-yong Sung
Samsung Electronics
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Challenges in Plasma Surface Interactions Control for Microelectronics Nanofabrication
ORAL · Invited
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Presenters
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Gottlieb Oehrlein
University of Maryland
Authors
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Gottlieb Oehrlein
University of Maryland
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High-Performance Computing in Plasma Reactor Scale Simulations: A Review and Prospects
ORAL · Invited
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Presenters
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Laxminarayan L Raja
The University of Texas at Austin
Authors
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Laxminarayan L Raja
The University of Texas at Austin
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Coffee Break
COFFEE_KLATCH
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Profile Simulation for Advanced Semiconductor Fabrication: Challenges and Opportunities from the Etch Perspective
ORAL · Invited
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Presenters
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Du Zhang
TEL Technology Center, America, LLC
Authors
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Du Zhang
TEL Technology Center, America, LLC
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Toru Hisamatsu
TEL Technology Center, America, LLC
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Akiteru Ko
TEL TECHNOLOGY CENTER, AMERICA, LLC, TEL Technology Center, America, LLC
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Peter Biolsi
TEL Technology Center, America, LLC
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Role of Machine Learning
ORAL · Invited
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Presenters
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Satoshi Hamaguchi
Osaka University, Japan, Osaka University
Authors
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Satoshi Hamaguchi
Osaka University, Japan, Osaka University
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Break
COFFEE_KLATCH
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Panel Discussion
COFFEE_KLATCH
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