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Diagnostics III

FOCUS · DF1 · ID: 1530243

Presentations

  • Development of a flat-cutoff sensor for non-invasive plasma density measurement in plasma processing

    ORAL

    –

    Publication: [1] H. J. Yeom, J. H. Kim, D. H. Choi, E. S. Choi, M. Y. Yoon, D. J. Seong, Shin Jae You, and Hyo-Chang Lee, Flat cutoff probe for real-time electron density measurement in industrial plasma processing, Plasma Sources Sci. Technol. 29 (2020) 035016 (13pp)<br>[2] Hyo-Chang Lee, Jung Hyung Kim, Daejin Seong, Hee Jung Yeom, PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS, WAFER-TYPE PLASMA DIAGNOSIS APPARATUS IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED, AND ELECTROSTATIC CHUCK IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED, Korea Patent. 10-2020-0095022 , PCT Patent. PCT/KR2019/004500, US Patent. 17050373, China Patent. 201980028803.9, EU Patent. 19912976.8, Japan Patent. 52002369478<br>[3] Hyo-Chang Lee, Jung Hyung Kim, Hee Jung Yeom, Device for measuring plasma ion density and Apparatus for <br>plasma diagnostics using the same, Korea Patent. 1020210022899, US Patent. 17222937, China Patent. 2021110374496.9, EU Patent. 2021167098, Japan Patent. 7113110

    Presenters

    • HeeJung Yeom

      Korea Research Institute of Standards and Science

    Authors

    • HeeJung Yeom

      Korea Research Institute of Standards and Science

    • Min Young Yoon

      Korea Research Institute of Standards and science

    • Eun-Seok Choe

      Korea Research Institute of Standards and Science

    • Dae Jin Seong

      Korea Research Institute of Standards and Science

    • Gwang-Seok Choi

      Korea Research Institute of Standards and Science

    • Shin Jae You

      Chungnam Natl Univ, Department of Physics, Chungnam National University

    • Jung Hyung Kim

      Korea Research Institute of Standards and Science

    • Hyo-Chang Lee

      Korea Aerospace University

    View abstract →