Probe Diagnostics
FOCUS · IF3 · ID: 546620
Presentations
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A novel approach for calculating the plasma resonance behavior excited by wall-integrated planar diagnostic probes with arbitrary geometry
ORAL
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Publication: [1] The multipole resonance probe: characterization of a prototype ,M. Lapke et al., Plasma<br>Sources Sci. Technol. 20, 042001 (2011).<br>[2] Plasma Resonance in a Radio-Frequency Probe,K. Takayama, H. Ikegami, und S. Miyazaki,<br>Phys. Rev. Let. 5, 238 (1960).<br>[3] High-Frequency Dielectric Resonance Probe for the Measurement of Plasma Densities,A. M.<br>Messiaen and P. E. Vandenplas, J. Appl. Phys. 37, 1718 (1966)<br>[4] RF Admittance Measurements of a Slotted-Sphere Antenna Immersed in a Plasma,J. A. Waletzko<br> and G. Bekefi, Radio Sci. 2, 489 (1967).<br>[5] The impedance of a dipole antenna in the ionosphere: 1. Experimental study,N. Vernet, R.<br>Manning, and J. L. Steinberg, Radio Sci. 10, 517 (1975).<br>[6] Measurement of absolute electron density with a plasma impedance probe ,D. D. Blackwell,<br>D. N. Walker, and W. E. Amatucci, Rev. Sci. Instrum 76, 023503 (2005).<br>[7] Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with<br>Processing Plasmas,H. Kokura, K. Nakamura, I.P. Ghanashev, and H. Sugai, Japan. J. Appl.<br>Phys 38, 5262 (1999).<br>[8] Practical implementation of a two-hemisphere plasma absorption probe ,C. Scharwitz, M.<br>Böke, J. Winter, M. Lapke, T. Mussenbrock, and R. P. Brinkmann, Appl. Phys. Lett. 94,<br>011502 (2009).<br>[9] The multipole resonance probe: A concept for simultaneous determination of plasma density,<br>electron temperature, and collision rate in low-pressure plasmas ,M. Lapke, T. Mussenbrock,<br>and R. P. Brinkmann, Appl. Phys. Lett. 93, 051502 (2008).<br>[10] Interaction of an antenna with a hot plasma and the theory of resonance probes ,J. A. Fejer,<br>Radio Sci. 68D, 1171 (1964)<br>[11] THE BEHAVIOR OF THE RESONANCE PROBE IN A PLASMA ,R. S. Harp, Appl. Phys.<br>Lett. 4, 186 (1964)<br>[12] Characteristics of the Plasma Resonance Probe ,R. S. Harp and F. W. Crawford, J. Appl.<br>Phys. 35, 3436 (1964)<br>[13] Characteristics of Resonance Probes ,T. Dote and T. Ichimiya, J. Appl. Phys. 36, 1866 (1965).<br>[14] An Investigation of Boundary Theories for the Resonance Probe ,R. J. Kostelnicek, Radio<br>Sci. 3, 319 (1968).<br>[15] Linear and Nonlinear Response of a Plasma Sheath to Radio Frequency Potentials ,A. J.<br>Cohen and G. Bekefi, Phys. Fluids 14, 1512 (1971).<br>[16] The impedance characteristic of a spherical probe in an isotropic plasma ,J. Tarstrup and W.<br>J. Heikkila, Radio Sci. 4, 493 (1972).<br>[17] Impedance of an ion-sheathed spherical probe in a warm, isotropic plasma ,T. Aso, Radio Sci.<br>8, 139 (1973).<br>[18] Radio-Frequency Probes in a Nonlinear Isotropic Plasma ,C. C. Bantin and K. G. Balmain,<br>Can. J. Phys. 52, 291 (1974).<br>[19] A novel technique for plasma density measurement using surface-wave transmission spectra<br>,S. Dine, J.P. Booth, G.A Curley, C.S. Corr, J. Jolly, and J. Guillon, Plasma Scources Sci.<br>Technol. 14, 777 (2005).<br>[20] On collisionless energy absorption in plasmas: Theory and experiment in spherical geometry<br>,D. N. Walker, R. F. Fernsler, D. D. Blackwell, W. E. Amatucci, and S. J. Messer, Phys.<br>Plasmas 13, 032108 (2006).<br>[21] Modeling and simulation of the plasma absorption probe ,M. Lapke, T. Mussenbrock, R. P.<br>Brinkmann, C. Scharwitz, M. Böke, and J. Winter, Appl. Phys. Lett. 90, 121502 (2007).<br>[22] Simulation of resistive microwave resonator probe for high-pressure plasma diagnostics ,J.<br>Xu, K. Nakamura, Q. Zhang, and H. Sugai, Plasma Sources Sci. Technol. 18 045009, (2009).<br>[23] Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film<br>and sheath ,J. Xu, J. Shi, J. Zhang, Q. Zhang, K. Nakamura, and H. Sugai, Chinese Phys. B<br>19 075206, (2010).<br>[24] Experimental and Simulational Studies on the Theoretical Model of the Plasma Absorption<br>Probe ,B. Li, H. Li, Z. Chen, J. Xie G. Feng, and W. Liu, Plasma Sci. Technol. 12, 513 (2010).<br>[25] Modeling Microwave Resonance of Curling Probe for Density Measurements in Reactive <br>Plasmas ,I. Linag, K. Nakamura, and H. Sugai, Appl. Phys. Express 4, 066101 (2011)<br>[26] Active plasma resonance spectroscopy: a functional analytic description ,M. Lapke, J. Ober-<br>15<br>rath, T. Mussenbrock und R. P. Brinkmann, Plasma Scources Sci. Technol. 22, 025005 (2013).<br>[27] Active plasma resonance spectroscopy: eigenfunction solutions in spherical geometry ,J. Oberrath and R. P. Brinkmann, Plasma Sources Sci. Technol. 23, 065025 (2014)<br>[28] The Multipole Resonance Probe: Progression and Evaluation of a Process Compatible Plasma<br>Sensor ,C. Schulz and I. Rolfes, IEEE Sensors Journal 14 Issue: 10,Sensors Applications<br>Symposium (SAS), IEEE (2014)<br>[29] M. Friedrichs and J. Oberrath,"The planar multipole resonance probe: a functional analytic<br>approach," EPJ Techn Instrum, vol. 5, Aug. 2018.<br>[30] M. Friedrichs, D. Pohle, I. Rolfes and J. Oberrath, "Planar Multipole Resonance Probe:<br>Comparison of Full-wave Electromagnetic Simulation and Electrostatic Approximation," 2019<br>Kleinheubach Conference, 2019, pp. 1-3.<br>[31] C.Wang, M. Friedrichs, J.Oberrath and R.P. Brinkmann 2021 Plasma Sources Sci. Technol.<br>30 105011<br>[32] The Planar Multipole Resonance Probe: Challenges and Prospects of a Planar Plasma Sensor,<br>C. Schulz, T. Styrnoll, P. Awakowicz and I. Rolfes, IEEE Transactions on Instrumentation<br>and Measurement 64, 14981187 (2015)<br>[33] Flat cutoff probe for real-time electron density measurement in industrial plasma processing,<br>H J Yeom et al 2020 Plasma Sources Sci. Technol. 29 035016
Presenters
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Peng Liang
South Westphalia University of Applied Science Soest
Authors
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Michael Friedrichs
South Westphalia University of Applied Science Soest
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Peng Liang
South Westphalia University of Applied Science Soest
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Chun Jie Wang
Ruhr-University of Bochum
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Ralf Peter Brinkmann
Ruhr-University of Bochum, Institute of Theoretical Electrical Engineering, Faculty of Electrical Engineering and Information Technology, Ruhr-University Bochum, Germany
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Jens Oberrath
South Westphalia University of Applied Science
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Second harmonic currents in rf-biased, inductively coupled plasmas
ORAL
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Presenters
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Mark Sobolewski
National Institute of Standards and Technology
Authors
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Mark Sobolewski
National Institute of Standards and Technology
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The performance of the pulse bias hairpin resonator probe for negative ion diagnostic
ORAL
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Publication: [1] Sirse, N., Karkari, S.K. and Turner, M.M., 2015. Probing negative ion density and temperature using a resonance hairpin probe. Plasma Sources Science and Technology, 24(2), p.022001.<br>[2] Singh, P. and Karkari, S.K., 2022. Equilibrium properties of inhomogeneous partially-magnetized plasma containing negative ions. Journal of Physics D: Applied Physics, 55(23), p.235201.
Presenters
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Pawandeep Singh
Institute for Plasma Research
Authors
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Pawandeep Singh
Institute for Plasma Research
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Swati Swati
Institute for Plasma Research
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Jay K Joshi
Albot Technologies Pvt. Ltd, Pune, Maharashtra 411044, India
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Nageswara R Epuru
Institute for Plasma Research
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Yashshri Patil
Institute for Plasma Research
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Shantanu Karkari
Institute for Plasma Research
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Power law parametrization of the ion collecting area for a planar Langmuir probe diagnostic
ORAL · Invited
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Publication: Y. Lim et al, Plasma Sources Sci. Technol. 31 (2022) 024001, "Benchmark experiments of the power law parametrization of the effective ion collecting area of a planar Langmuir probe in low temperature plasmas"
Presenters
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Yegeon Lim
KAIST
Authors
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Yegeon Lim
KAIST
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Gregory Severn
University of San Diego
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Chi-Shung Yip
Chinese Academy of Sciences
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Young-chul Ghim
KAIST, Department of Nuclear and Quantum Engineering, KAIST, Daejeon, 34141, S. Korea
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Analysis of temperature dependency of the resonant frequency for electron density measurement with curling probe
ORAL
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Presenters
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Daisuke Ogawa
Chubu University
Authors
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Daisuke Ogawa
Chubu University
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Keiji Nakamura
Chubu University
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Hideo Sugai
Chubu University
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Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias
ORAL
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Presenters
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Makoto Sekine
Nagoya University, Nagoya Univ
Authors
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Makoto Sekine
Nagoya University, Nagoya Univ
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Bibhuti B Sahu
Department of Energy Science and Engineering, IIT Delhi
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Shogo Hattori
Nagoya University
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Takayoshi Tsutsumi
Nagoya University, Nagoya Univ
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Nikolay Britun
Nagoya University, Center for Low-temperature Plasma Sciences, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan.
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Kenji Ishikawa
Nagoya Univ, Nagoya University, Nagoya University, Japan
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Hirohiko Tanaka
Nagoya University
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Taku Gohira
Tokyo Electron Miyagi
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Noriyasu Ohno
Nagoya University, Hiroshima University
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Masaru Hori
Nagoya Univ
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