Phase-Resolved Analysis of an Inductively Coupled Plasma with a Dual-Frequency Bias Using a Two-Dimensional Particle-in-Cell Simulation

A two-dimensional (2D) particle-in-cell (PIC) Monte Carlo collision (MCC) simulation has the advantage of investigating the energy and angle distribution of incident ions on the wafer by directly calculating the dynamics and collisions of each particle. Inductively coupled plasmas (ICPs) have antenna coils on the upper plate to generate plasmas by skin effect and apply a bias to the wafer to pull ions. The plasma profiles and the bias affect the ion energy and angle distributions (IEADs). This study examines the phase-resolved ion energy and angle distributions by applying a dual-frequency RF bias in addition to the ICP source using a 2D PIC simulation. The ICP power is directly related to the ion flux, the low-frequency bias directly affects the ion energy, and the angle distribution is affected by the potential profile.