Importance of C<sub>3</sub>H<sub>y</sub> and C<sub>3</sub>H<sub>y</sub><sup>+</sup> in Modeling of Radio Frequency Methane Plasma
POSTER
Abstract
Methane is widely used in not only semiconductor industry but also diamond-like carbon and carbon nanotubes production. Radio frequency methane plasma was studied by Tachibana in 1984 [1], and some other researchers presented different models. In their models, however, species and related reaction steps were limited up to C2Hy, C2Hy+, and C3H8, although mass spectroscopy analysis showed that various C3Hy/C3H5+ species were detected in the plasma. In the present study, methane plasma was studied by a capacitively coupled plasma modeling with 21 neutrals and 19 ions in the gas phase reaction, including some C3Hy and C3Hy+. One- and two-dimensional (1-D and 2-D respectively) simulation models were prepared to calculate two different gases: CH4 and CH4/H2 (8/92 %). In the case of pure CH4, CH5+, C2H5+, and C3H5+ were abundant ions; among them, C3H5+ was the most major ion which was omitted in the past reports. It was proved that including C3Hy and C3Hy+ into the reaction set was essentially important to reproduce the experimental results. Time evolution of major ions and neutrals showed similar trends in both the 1-D and 2-D models, and continuous decrease of CH4 in the plasma for a longer process time was similar to the experiment results by [1].
Publication: [1] K. Tachibana, et al, J. Phys. D: Appl. Phys. 17, 1727 (1984).<br>[2] C. Cavallotti, et al, J. Electrochem. Soc. 145, 4332 (1998).<br>[3] I. B. Denysenko, et al, J. Appl. Phys. 95, 2713 (2004).<br>[4] https://athenasys.co.jp/main/product/bosprom/bosprom.html<br>[5] F. H. Field, et al, J. Am. Chem. Soc., 87, 3289 (1965)
Presenters
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Kei Ikeda
ATHENASYS Co. Ltd., ATHENASYS Co., Ltd.
Authors
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Kei Ikeda
ATHENASYS Co. Ltd., ATHENASYS Co., Ltd.
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Tsukasa Kobayashi
ATHENASYS Co. Ltd.