A 2D Particle-In-Cell model of an Electron Cyclotron Resonance plasma for the purpose of lifetime tests

Stable and high transmission of the optical elements in lithography machines is crucial for high-volume manufacturing of semiconductor devices. This requires understanding and solving of the impact of EUV and of the EUV-induced plasma on the optical elements. An elaborate set of tests is realized in a low-pressure ECR plasma environment to ensure the endurance of the optical elements. An implicit energy-conserving electromagnetic 2D particle-in-cell code is utilized to calculate the plasma properties and the load to the optical samples. The simulations exhibit a rotationally varying electron energy distribution function in the magnetized region and a bi-Maxwellian electron energy distribution function in the afterglow. The ion energy flux distribution function on the optical samples is calculated and their relation to their lifetime is discussed.