Ab initio Electron-scattering data for perfluorocyclobutane (c-C$_4$F$_8$)

Perfluorocyclobutane or c-C$_4$F$_8$ is a widely used processing gas in the plasma etching of silicon dioxide. Therefore, a comprehensive and accurate analysis on the electron-scattering from c-C$_4$F$_8$ molecule is important to obtain precise particle densities and fluxes from numerical plasma simulations. With four CF$_2$ moieties arranged in a puckered ring, c-C$_4$F$_8$ has a stable geometry belonging to the D$_{2d}$ symmetry. Due to its somewhat large structure, only a limited number of calculations on the electron scattering from c-C$_4$F$_8$ are available in the literature$^1$. In the present work, we use the molecular R-matrix approach$^2$ employed via Quantemol Electron Collisions (QEC)$^3$ to treat the electron scattering from c-C$_4$F$_8$. The computed R-matrix cross sections for the total elastic scattering and momentum transfer have good overall agreement with the experimental results$^4$. The cross sections for other inelastic electron-scattering processes including electron-impact electronic excitation, dissociation, and dissociative electron attachment will be provided with more physical insights. The results from plasma simulations obtained with the computed \emph{ab initio} data will also be presented. $^1$C. Winstead and V. McKoy , J. Chem. Phys. {\bf 114}, 7407(2001). $^2$J. Tennyson, Phys. Rep. {\bf 491}, 29 (2010). $^3$B. Cooper \emph{et al.}, Atoms {\bf 7}, 97 (2019). $^4$M. Jelisavcic \emph{et al.}, J. Chem. Phys. {\bf 121}, 5272 (2004).