Atomic Layer Processes

Presentations

• Optimisation and Understanding of Plasma Enhanced Atomic Layer Deposition Processes Using Quasi In-situ X-ray Photoelectron Spectroscopy

  ORAL · Invited

  Oct. 5, 2022, 1:30 AM – Oct. 5, 2022, 2:00 AM

  Publication: Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance: https://doi.org/10.1088/1361-6463/ac360c<br><br>Analysing trimethylaluminum infiltration into polymer brushes using a scalable area selective vapor phase process: https://doi.org/10.1039/D0MA00928H<br><br>Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach: https://doi.org/10.1016/j.apsusc.2020.145987<br><br>Growth Chemistry of Cobalt Nitride by Plasma Enhanced Atomic Layer Deposition: Submitted to Journal of Physics D

  Presenters

  • Robert O'Connor

    Dublin City University

  Authors

  • Robert O'Connor

    Dublin City University

  • Shane O'Donnell

    DCU

  • Caitlin McFeely

    DCU

  • Feljin Jose

    DCU

  • Matthew Snelgrove

    DCU

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• Damage mitigation in atomic layer etching of GaN by cyclic exposure of BCl₃ gas and F₂ added Ar plasma at high substrate temperature

  ORAL

  Oct. 5, 2022, 2:00 AM – Oct. 5, 2022, 2:15 AM

  Presenters

  • Shohei Nakamura

    SCREEN Holdings Co., Ltd.

  Authors

  • Shohei Nakamura

    SCREEN Holdings Co., Ltd.

  • Atsushi Tanide

    SCREEN Holdings Co., Ltd.

  • Masafumi Kawagoe

    SCREEN Holdings Co., Ltd.

  • Soichi Nadahara

    SCREEN Holdings Co., Ltd.

  • Kenji Ishikawa

    Nagoya Univ, Nagoya University, Nagoya University, Japan

  • Osamu Oda

    Nagoya Univ

  • Masaru Hori

    Nagoya Univ, Nagoya University, Center for Low-temperature Plasma Sciences, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan.

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• Topographically-selective Atomic Layer Etching of SiO₂ using fluorine-containing plasma

  ORAL

  Oct. 5, 2022, 2:15 AM – Oct. 5, 2022, 2:30 AM

  Presenters

  • Airah P Osonio

    Nagoya University

  Authors

  • Airah P Osonio

    Nagoya University

  • Takayoshi Tsutsumi

    Nagoya University, Nagoya Univ

  • Bablu Mukherjee

    ASM Japan K.K.

  • Ranjit Borude

    ASM Japan K.K.

  • Nobuyoshi Kobayashi

    Nagoya University

  • Masaru Hori

    Nagoya Univ, Nagoya University, Center for Low-temperature Plasma Sciences, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan.

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• Plasma-assisted thermal-cyclic atomic-layer etching for selective removal of thin films

  ORAL · Invited

  Oct. 5, 2022, 2:30 AM – Oct. 5, 2022, 3:00 AM

  Presenters

  • Kazunori Shinoda

    Hitachi

  Authors

  • Kazunori Shinoda

    Hitachi

  • Nobuya Miyoshi

    Hitachi

  • Hiroyuki Kobayashi

    Hitachi

  • Masaru Izawa

    Hitachi High-Tech

  • Kenji Ishikawa

    Nagoya Univ, Nagoya University, Nagoya University, Japan

  • Masaru Hori

    Nagoya Univ, Nagoya University, Center for Low-temperature Plasma Sciences, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan.

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