Development of Three Dimensional Thermofluid Model for Ar-O<sub>2</sub> Loop Induction Thermal Plasmas with Reaction Rates for Dissociation of O<sub>2</sub> on the Substrate
ORAL
Abstract
In this report, a three-dimensional thermo-fluid model of an Ar/O2 loop inductively coupled thermal plasma (Loop-ICTP) was developed to investigate the dissociation reaction of oxygen molecules as well as heavy-particle temperature, electron temperature, gas flow fields inside the torch and on the substrate surface. The Loop-ICTP is generated in a loop-shaped quartz tube sandwiched between circular coils . Then, a part of the Loop-ICTP is maintained with a long linear shape on the substrate. Afterwards, scanning the substrate perpendicularly to the linear plasma, the whole substrate surface area can be exposed by the plasma for two-dimensional (2D) surface modification . To understand the physical state of such Loop-ICTP in detail, numerical simulation is very useful. Results showed that increasing coil current value elevates the heavy particle temperature and the mass fraction of oxygen atoms effectively at the substrate surface. This suggests the possibility of fast oxidation of substrate surfaces by setting the adequate current value.
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Presenters
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Tomoya Fuwa
Kanazawa University
Authors
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Tomoya Fuwa
Kanazawa University
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Hiroya Hara
Kanazawa University
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Yasunori Tanaka
Kanazawa University
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Yusuke Nakano
Kanazawa Univarsity, Kanazawa University
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Tatsuo Ishijima
Kanazawa Univarsity, Kanazawa University
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Tetsuya Yukimoto
CV Research Corporation
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Tetsuya Yukimoto
CV Research Corporation