Plasma Applications
FOCUS · FT1 · ID: 549993
Presentations
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The role of atomic physics in collisional-radiative modeling of tin plasmas for lithography
ORAL · Invited
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Presenters
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James Colgan
LANL
Authors
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James Colgan
LANL
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Profiling of High-Pressure DC Microdischarge for excimer emission.
ORAL
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Presenters
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Rumysa Manzoor
Indian Institute of Technology Delhi
Authors
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Rumysa Manzoor
Indian Institute of Technology Delhi
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Bridging the gap between fluid and kinetic plasma simulations for industrial plasma sources
ORAL · Invited
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Presenters
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Alexandre Likhanskii
Applied Materials Inc
Authors
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Alexandre Likhanskii
Applied Materials Inc
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