Modeling - Plasma Processing and Chemistry II

Presentations

• Two and Three Dimensional Inductive Coupled Plasma Remote Source Modeling with Single and Gas mixtures with Experimental Validation

  ORAL

  Oct. 6, 2022, 3:00 AM – Oct. 6, 2022, 3:15 AM

  Publication: Stephen E. Savas, Brad S. Mattson, Martin L. Hammond, Steven C. Selbrede, Patent US 6143129. <br><br>AVS 2021

  Presenters

  • Abhra Roy

    ESI Group

  Authors

  • Abhra Roy

    ESI Group

  • Shawming Ma

    Mattson Technology, Inc.

  • Luke Zhang

    Mattson Technology, Inc.

  • Yun Yang

    Mattson Technology, Inc.

  View abstract →

• Kinetic Study of Effects of RF Pulsing in Dual Frequency Capacitively Coupled Plasma

  ORAL

  Oct. 6, 2022, 3:15 AM – Oct. 6, 2022, 3:30 AM

  Presenters

  • Willca Villafana

    Princeton Plasma Physics Laboratory, Prince Plasma Physics Laboratory

  Authors

  • Abhishek Verma

    Applied Materials

  • Kallol Bera

    Applied Materials, Applied Materials, Inc.

  • Shahid Rauf

    Applied Materials Inc, USA, Applied Materials Inc, Applied Materials, Applied Materials Inc.

  • Dmytro Sydorenko

    University of Alberta, Edmonton, Alberta T6G 2E1, Canada, University of Alberta, Canada

  • Igor D Kaganovich

    Princeton Plasma Physics Laboratory, Princeton University, USA, Princeton Plasma Physics Laboratory

  • Willca Villafana

    Princeton Plasma Physics Laboratory, Prince Plasma Physics Laboratory

  View abstract →

• Insights from Modeling Low-Pressure High-Voltage Dual-Frequency Capacitively Coupled Plasmas

  ORAL · Invited

  Oct. 6, 2022, 3:30 AM – Oct. 6, 2022, 4:00 AM

  Presenters

  • Amanda M Lietz

    Sandia National Laboratories

  Authors

  • Amanda M Lietz

    Sandia National Laboratories

  • Shahid Rauf

    Applied Materials Inc, USA, Applied Materials Inc, Applied Materials, Applied Materials Inc.

  • Peng Tian

    Applied Materials Inc, USA, Applied Materials Inc., Applied Materials Inc

  • Jason Kenney

    Applied Materials Inc, USA, Applied Materials Inc.

  • Matthew M Hopkins

    Sandia National Laboratories, Sandia National Laboratory

  View abstract →

• Particle-in-Cell Techniques for Simulations of Magnetron Sputtering

  ORAL

  Oct. 6, 2022, 4:00 AM – Oct. 6, 2022, 4:15 AM

  Presenters

  • Joseph G Theis

    University of Colorado, Boulder

  Authors

  • Joseph G Theis

    University of Colorado, Boulder

  • Gregory R Werner

    University of Colorado, Boulder

  • Thomas G Jenkins

    Tech-X Corporation

  • Daniel Main

    Tech-X Corporation

  • John R Cary

    University of Colorado, Boulder

  View abstract →

• Hybrid Plasma Modeling of Low-Pressure Oxygen Plasma in Capacitively Coupled Plasma Reactors

  ORAL

  Oct. 6, 2022, 4:15 AM – Oct. 6, 2022, 4:30 AM

  Presenters

  • Sathya S Ganta

    Applied Materials Inc

  Authors

  • Sathya S Ganta

    Applied Materials Inc

  • Han Luo

    Applied Materials Inc

  • Shahid Rauf

    Applied Materials Inc, USA, Applied Materials Inc, Applied Materials, Applied Materials Inc.

  • Kallol Bera

    Applied Materials, Applied Materials, Inc.

  View abstract →

• Hybrid Plasma Simulation of RF Hollow Cathode Discharge at Moderate Pressure

  ORAL

  Oct. 6, 2022, 4:30 AM – Oct. 6, 2022, 4:45 AM

  Presenters

  • Kallol Bera

    Applied Materials, Applied Materials, Inc.

  Authors

  • Kallol Bera

    Applied Materials, Applied Materials, Inc.

  • Abhishek Verma

    Applied Materials

  • Sathya S Ganta

    Applied Materials Inc

  • Shahid Rauf

    Applied Materials Inc, USA, Applied Materials Inc, Applied Materials, Applied Materials Inc.

  • Ken Collins

    Applied Materials, Inc.

  View abstract →

• Modelling of a Toroidal Wave Heated Plasma Source for the Remote Generation of Neutral Radicals

  ORAL

  Oct. 6, 2022, 4:45 AM – Oct. 6, 2022, 5:00 AM

  Presenters

  • Scott J Doyle

    University of Michigan

  Authors

  • Scott J Doyle

    University of Michigan

  • Amanda M Larson

    MKS Instruments, Inc

  • Guy Rosenzweig

    MKS Instruments, Inc.

  • Keith Koai

    MKS Instruments, Inc.

  • Mark J Kushner

    University of Michigan, Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, MI 48109-2122, United States of America

  View abstract →