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Inductively Coupled Plasmas

ORAL · FF1 · ID: 546394

Presentations

  • Formation of atomic hydrogen and negative ions in low-pressure inductively coupled hydrogen plasmas: two-dimensional simulations incorporating vibrational kinetics and gas heating

    ORAL

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    Presenters

    • James Dedrick

      York Plasma Institute, Department of Physics, University of York, Heslington, York, YO10 5DD, UK

    Authors

    • James Dedrick

      York Plasma Institute, Department of Physics, University of York, Heslington, York, YO10 5DD, UK

    • Gregory J Smith

      York Plasma Institute, Department of Physics, University of York, Heslington, York, YO10 5DD, UK

    • Paola Diomede

      Maastricht University, Faculty of Science and Engineering, Maastricht University, Paul Henry Spaaklan 1 6229 GS Maastricht, the Netherlands

    • Andrew R Gibson

      Research Group for Biomedical Plasma Technology, Faculty of Electrical Engineering and Information Sciences, Ruhr University Bochum, Bochum, Germany., 1) Research Group for Biomedical Plasma Technology, Ruhr-Universität Bochum, Germany; 2) Institute for Electrical Engineering and Plasma Technology, Ruhr-Universität Bochum, Germ, Research Group for Biomedical Plasma Technology, Ruhr-University Bochum, Universitätsstraße 150 D-44801 Bo­chum, Germany, Ruhr University Bochum, Germany, Institute of Electrical Engineering and Plasma Technology, Faculty of Electrical Engineering and Information Technology, Ruhr-University Bochum, Germany, Ruhr University Bochum

    • Scott J Doyle

      Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, MI 48109-2122, United States of America

    • Vasco Guerra

      Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico - Universidade de Lisboa, Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, Lisbon, Portugal, Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, Portugal, Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, Av. Rovisco Pais 1, 1049-001 Lisboa, Portugal

    • Mark J Kushner

      University of Michigan, Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, MI 48109-2122, United States of America

    • Timo Gans

      York Plasma Institute, Department of Physics, University of York, Heslington, York, YO10 5DD, UK, School of Physical Sciences & National Centre for Plasma Science and Technology (NCPST), Dublin City University, Dublin 9, Ireland, Dublin City University

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  • Spatial electromagnetic diagnostics of overshoot phenomenon in pulsed inductively coupled Ar plasmas

    ORAL

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    Presenters

    • Xiangyun Lv

      Dalian University of Technology

    Authors

    • Xiangyun Lv

      Dalian University of Technology

    • Kai Zhao

      Dalian University of Technology

    • Quan-Zhi Zhang

      Dalian University of Technology, Dalian University of Technology, China

    • Fei Gao

      Dalian University of Technology

    • You-Nian Wang

      Dalian University of Technology, Dalian University of Technolpgy, Dalian University of Technology, China

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  • An introduction to the role of chemical models in the enthalpy rebuilding procedure of Inductively Coupled Plasma facilities

    ORAL

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    Publication: - we are planning to present a full conference paper about the role of the chemical models in the enthalpy rebuilding using a Bayesian framework at the 9th International Workshop on Radiation of High Temperature Gases for Space Missions or AIAA Aviation forum of next year.

    Presenters

    • Enrico Anfuso

      Vrije Universiteit Brussel & von Karman Institute

    Authors

    • Enrico Anfuso

      Vrije Universiteit Brussel & von Karman Institute

    • Andrea Fagnani

      Vrije Universiteit Brussel & von Karman Institute

    • Olivier Chazot

      von Karman Institute for Fluid Dynamics

    View abstract →