Plasma Etching

Presentations

• Low Bias Frequencies for High Aspect Ratio Plasma Etching

  ORAL

  Oct. 5, 2022, 9:00 PM – Oct. 5, 2022, 9:15 PM

  Presenters

  • Evan Litch

    University of Michigan

  Authors

  • Evan Litch

    University of Michigan

  • Hyunjae Lee

    Mechatronics Research, Samsung Electronics Co., Mechatronics Research, Samsung Electronics Co., Ltd.,

  • Sang Ki Nam

    Mechatronics Research, Samsung Electronics Co., Mechatronics Research, Samsung Electronics Co., Ltd.,

  • Mark J Kushner

    University of Michigan, Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, MI 48109-2122, United States of America

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• Effects of the focus ring on uniformity in capacitively coupled plasma etching reactors

  ORAL

  Oct. 5, 2022, 9:15 PM – Oct. 5, 2022, 9:30 PM

  Presenters

  • Fang-Fang Ma

    Dalian University of Technology

  Authors

  • Fang-Fang Ma

    Dalian University of Technology

  • Quan-Zhi Zhang

    Dalian University of Technology, Dalian University of Technology, China

  • Jing-Yu Sun

    Dalian University of Technology, Dalian University of Technology, China

  • You-Nian Wang

    Dalian University of Technology, Dalian University of Technolpgy, Dalian University of Technology, China

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• Development of validated fluorocarbon plasma chemistry for multi-dimensional modeling of semiconductor plasma etch processes

  ORAL · Invited

  Oct. 5, 2022, 9:30 PM – Oct. 5, 2022, 10:00 PM

  Publication: D. Levko, C. Shukla, R. R. Upadhyay, and L. L. Raja, J. Vac. Sci. Technol. B 39, 042202 (2021)<br>D. Levko, C. Shukla, and L. L. Raja, J. Vac. Sci. Technol. B 39, 062204 (2021)

  Presenters

  • Dmitry Levko

    Esgee Technologies

  Authors

  • Dmitry Levko

    Esgee Technologies

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• Development of virtual metrology using plasma information to predict mask shape in HAR etch process

  ORAL

  Oct. 5, 2022, 10:00 PM – Oct. 5, 2022, 10:15 PM

  Presenters

  • Jaemin Song

    Department of Energy Systems Engineering, Seoul National University, Seoul 08826, Korea, Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea

  Authors

  • Jaemin Song

    Department of Energy Systems Engineering, Seoul National University, Seoul 08826, Korea, Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea

  • Namjae Bae

    Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea

  • Jihoon Park

    Department of Energy Systems Engineering, Seoul National University, Seoul 08826, Korea, Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea

  • Taejun Park

    Department of Energy Systems Engineering, Seoul National University, Seoul 08826, Korea, Department of Energy Systems Engineering, Seoul National University, Soeul, South Korea

  • Ji-Won Kwon

    Department of Energy Systems Engineering, Seoul National University, Soeul, South Korea

  • Sangwon Ryu

    Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea

  • Ingyu Lee

    Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea

  • Gon-Ho Kim

    Department of Energy Systems Engineering, Seoul National University, Seoul 08826, Korea, Department of Energy Systems Engineering, Seoul National University, Seoul, South Korea

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• Electron-assisted photoresist etching in an inductively coupled oxygen plasma via low-energy electron beam

  ORAL

  Oct. 5, 2022, 10:15 PM – Oct. 5, 2022, 10:30 PM

  Presenters

  • Jiwon Jung

    Hanyang university, Hanyang University

  Authors

  • Jiwon Jung

    Hanyang university, Hanyang University

  • Chin-Wook Chung

    Hanyang university, Hanyang University, Hanyang Univ

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• Ar plasma nanostructuring of PTFE for the wettability transition from hydrophobic to superhydrophobic and hydrophilic surfaces

  ORAL

  Oct. 5, 2022, 10:30 PM – Oct. 5, 2022, 10:45 PM

  Publication: [1] V. Pachchigar, U.K. Gaur, A. T. V., S. K. P., S. Hans, S.K. Srivastava, M. Ranjan, Hydrophobic to superhydrophobic and hydrophilic transitions of Ar plasma-nanostructured PTFE surfaces, Plasma Process. Polym. n/a (2022) e2200037. doi:https://doi.org/10.1002/ppap.202200037.<br>[2] V. Pachchigar, M. Ranjan, K.P. Sooraj, S. Augustine, D. Kumawat, K. Tahiliani, S. Mukherjee, Self-cleaning and bouncing behaviour of ion irradiation produced nanostructured superhydrophobic PTFE surfaces, Surf. Coatings Technol. 420 (2021) 127331. doi:https://doi.org/10.1016/j.surfcoat.2021.127331.

  Presenters

  • Vivek Pachchigar

    Institute for Plasma Research, Bhat

  Authors

  • Vivek Pachchigar

    Institute for Plasma Research, Bhat

  • Umesh K Gaur

    Institute for Plasma Research

  • Sooraj K. P.

    Institute for Plasma Research

  • Sukriti Hans

    Institute for Plasma Research

  • Mukesh Ranjan

    Institute for Plasma Research

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• Achieving selective etching of SiN and SiO₂ over amorphous carbon during CF₄/H₂ by controlling substrate temperature

  ORAL

  Oct. 5, 2022, 10:45 PM – Oct. 5, 2022, 11:00 PM

  Presenters

  • Shih-Nan Hsiao

    Center for Low-temperature Plasma Sciences, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan., Nagoya University, Nagoya Univ

  Authors

  • Shih-Nan Hsiao

    Center for Low-temperature Plasma Sciences, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan., Nagoya University, Nagoya Univ

  • Thi-Thuy-Nga Nguyen

    Nagoya University

  • Takayoshi Tsutsumi

    Nagoya University, Nagoya Univ

  • Kenji Ishikawa

    Nagoya Univ, Nagoya University, Nagoya University, Japan

  • Makoto Sekine

    Nagoya University, Nagoya Univ

  • Masaru Hori

    Nagoya Univ, Nagoya University, Center for Low-temperature Plasma Sciences, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan.

  View abstract →