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Capacitively Coupled Plasmas I

FOCUS · DT2 · ID: 546220





Presentations

  • Resonant sheath heating in weakly magnetized capacitively coupled plasmas due to electron-cyclotron motion

    ORAL · Invited

    Publication: [1] Sun et al 2022 Plasma Sources Sci. Technol. 31 045011<br>[2] Zhang et al 2021 Phys. Rev. E 104, 045209

    Presenters

    • Jing-Yu Sun

      Dalian University of Technology, Dalian University of Technology, China

    Authors

    • Jing-Yu Sun

      Dalian University of Technology, Dalian University of Technology, China

    • Quan-Zhi Zhang

      Dalian University of Technology, Dalian University of Technology, China

    • Julian Schulze

      Ruhr-University Bochum, Ruhr Univ Bochum, Ruhr University Bochum, Dalian University of Technology, Ruhr-University Bochum, Germany

    • You-Nian Wang

      Dalian University of Technology, Dalian University of Technolpgy, Dalian University of Technology, China

    View abstract →

  • GEC Student Excellence Award Finalist Presentation - Uniformity control by customized electrode designs in capacitive RF plasmas

    ORAL

    Publication: J. Vac. Sci. Technol. A 39, 063004 (2021); doi: 10.1116/6.0001327

    Presenters

    • Li Wang

      Dalian University of Technology, Ruhr-University Bochum

    Authors

    • Li Wang

      Dalian University of Technology, Ruhr-University Bochum

    • Peter Hartmann

      Wigner Research Center for Physics

    • Zoltan Donko

      Wigner Research Center, Wigner Research Center for Physics

    • Yuan-Hong Song

      Dalian University of Technology

    • Julian Schulze

      Ruhr University Bochum, Bochum University, Ruhr-Uni­ver­si­tät Bo­chum, Ruhr University Bochum, Germany, Ruhr-University Bochum; Dalian University of Technology, Ruhr-University Bochum

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  • Effect of the low-frequency voltage on nonlinear standing wave excitation in dual-frequency asymmetric capacitive discharges

    ORAL

    Presenters

    • Fang-Jie Zhou

      Dalian University of Technology

    Authors

    • Fang-Jie Zhou

      Dalian University of Technology

    • Jian-Kai Liu

      Dalian University of Technology

    • Kai Zhao

      Dalian University of Technology

    • You-Nian Wang

      Dalian University of Technology, Dalian University of Technolpgy, Dalian University of Technology, China

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  • Surface effects in a capacitive argon discharge in the intermediate pressure regime

    ORAL

    Publication: [1] Gudmundsson et al. Plasma Sources Science and Technology, 30 (2021) 125011

    Presenters

    • Jon T Gudmundsson

      University of Iceland

    Authors

    • Jon T Gudmundsson

      University of Iceland

    • Janez Krek

      Michigan State University

    • De-Qi Wen

      Michigan State University

    • Emi Kawamura

      University of California, Berkeley

    • Michael A Lieberman

      University of California, Berkeley

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  • The effects of different boundary surface materials on electron power absorption dynamics in capacitive RF plasmas

    ORAL

    Presenters

    • Florian Beckfeld

      Ruhr-University Bochum

    Authors

    • Florian Beckfeld

      Ruhr-University Bochum

    • David A. Schulenberg

      Ruhr-University Bochum

    • Ihor Korolov

      Ruhr University Bochum, Ruhr-Uni­ver­si­tät Bo­chum, Ruhr-University Bochum

    • Julian Schulze

      Ruhr University Bochum, Bochum University, Ruhr-Uni­ver­si­tät Bo­chum, Ruhr University Bochum, Germany, Ruhr-University Bochum; Dalian University of Technology, Ruhr-University Bochum

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  • Kinetic behaviors of secondary electrons in magnetized capacitively coupled argon plasmas

    ORAL

    Presenters

    • Hui Wen

      Dalian University of Technology

    Authors

    • Hui Wen

      Dalian University of Technology

    • Jing-Yu Sun

      Dalian University of Technology, Dalian University of Technology, China

    • Quan-Zhi Zhang

      Dalian University of Technology, Dalian University of Technology, China

    • You-Nian Wang

      Dalian University of Technology, Dalian University of Technolpgy, Dalian University of Technology, China

    View abstract →

  • GEC Student Excellence Award Finalist Presentation - Striations in dual-low-frequency (2/10 MHz) driven capacitively coupled CF<sub>4</sub> plasma

    ORAL

    Presenters

    • Xiao-Kun Wang

      Dalian University of Technology

    Authors

    • Xiao-Kun Wang

      Dalian University of Technology

    • Yong-Xin Liu

      Dalian University of Technology

    • Julian Schulze

      Ruhr-University Bochum, Ruhr Univ Bochum, Ruhr University Bochum, Dalian University of Technology, Ruhr-University Bochum, Germany

    • Zoltán Donkó

      Wigner Research Centre for Physics

    • You-Nian Wang

      Dalian University of Technology, Dalian University of Technolpgy, Dalian University of Technology, China

    View abstract →