Plasmas and Nanotechnology III
FOCUS · DF1 · ID: 545717
Presentations
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Microplasma Engineering of Functional Nanomaterials: Synthesis and Applications
ORAL · Invited
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Publication: 1. Microplasma Band Structure Engineering in Graphene Quantum Dots for Sensitive and Wide-Range pH Sensing, D Kurniawan, BA Anjali, O Setiawan, KK Ostrikov, YG Chung, WH Chiang, ACS Applied Materials & Interfaces, 2022, 14 (1), 1670–1683<br>2. Microplasma nanoengineering of emission-tuneable colloidal nitrogen-doped graphene quantum dots as smart environmental-responsive nanosensors and nanothermometers, D Kurniawan, RJ Weng, O Setiawan, KK Ostrikov, WH Chiang, Carbon, 2021, 185, 501-513<br>3. Ag Microplasma-Engineered Nanoassemblies on Cellulose Papers for Surface-Enhanced Raman Scattering and Catalytic Nitrophenol Reduction, YJ Yeh, WH Chiang, ACS Applied Nano Materials, 2021, 4 (6), 6364-6375
Presenters
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Wei-Hung Chiang
National Taiwan University of Science and Technology
Authors
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Wei-Hung Chiang
National Taiwan University of Science and Technology
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Multiscale transport modeling of reactive sputtering for fabrication of neuromorphic hardware
ORAL
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Publication: Multiscale transport modeling of reactive sputtering for fabrication of neuromorphic hardware, L. Vialetto, R. Lamprecht, C. Stuewe, T. Hemke, F. Zahari, H. Kohlstedt, T. Mussenbrock, J. Trieschmann, in preparation
Presenters
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Luca Vialetto
Theoretical Electrical Engineering, Faculty of Engineering, Kiel University, Kiel University
Authors
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Luca Vialetto
Theoretical Electrical Engineering, Faculty of Engineering, Kiel University, Kiel University
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Rouven Lamprecht
Nanoelectronics, Faculty of Engineering, Kiel University,
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Christian Stuewe
Theoretical Electrical Engineering, Faculty of Engineering, Kiel University
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Torben Hemke
Applied Electrodynamics and Plasma Technology, Department of Electrical Engineering and Information Sciences, Ruhr University Bochum
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Finn Zahari
Nanoelectronics, Faculty of Engineering, Kiel University
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Hermann Kohlstedt
Nanoelectronics, Faculty of Engineering, Kiel University
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Thomas Mussenbrock
Ruhr University Bochum, Bochum University, Ruhr-Universität Bochum, Applied Electrodynamics and Plasma Technology, Department of Electrical Engineering and Information Sciences, Ruhr University Bochum
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Jan Trieschmann
Kiel University, Christian-Albrechts-Universität zu Kiel, Theoretical Electrical Engineering, Faculty of Engineering, Kiel University
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Ion fluxes in EUV-induced plasma and their applications for optical components tests
ORAL
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Presenters
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Andrey Ushakov
TNO
Authors
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Andrey Ushakov
TNO
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Jacqueline van Veldhoven
TNO
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Chien-Ching Wu
TNO
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Michel van Putten
TNO
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Joop Meijlink
TNO
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