Plasma Applications
FOCUS · TF12 · ID: 14059
Presentations
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Microplasma-Driven Atomic Layer Deposition of Aluminum Oxide Etch-Free Patterning, and Gallium Oxide-Based Flexible DUV Photodetector
ORAL
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Presenters
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Jinhong Kim
University of Illinois at Urbana-Champai
Authors
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Jinhong Kim
University of Illinois at Urbana-Champai
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Dane J Sievers
University of Illinois Urbana Champaign
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Sung-Jin Park
University of Illinois, Eden Park Illumination, University of Illinois at Urbana-Champai, University of Illinois
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J. Gary Eden
University of Illinois at Urbana-Champaign
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Optimizing the deposition rate and ionized flux fraction of a high power impulse magnetron sputtering discharge
ORAL · Invited
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Publication: M. Rudolph, N. Brenning, M. A. Raadu, H. Hajihoseini,J. T. Gudmundsson, A. Anders, and D. Lundin, Plasma Sources Science and Technology 29, 05LT01 (2020).<br>N. Brenning, A. Butler, H. Hajihoseini, M. Rudolph, M. A.Raadu, J. T. Gudmundsson, T. Minea, and D. Lundin, Journal of Vacuum Science and Technology A38, 033008 (2020).<br>N. Brenning, H. Hajihoseini, M. Rudolph, M. A. Raadu, J. T. Gudmundsson, T. M. Minea and D. Lundin, Plasma Sources Science and Technology 30, 015015 (2021).
Presenters
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Martin Rudolph
Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany
Authors
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Martin Rudolph
Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany
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Nils Brenning
KTH Royal Institute of Technology, Stockholm, Sweden
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Hamidreza Hajihoseini
Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands
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Michael A Raadu
KTH Royal Institute of Technology, Stockholm, Sweden
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Tiberiu M Minea
Laboratoire de Physique des Gaz et Plasmas, UMR 8578 CNRS, Université Paris–Saclay, Orsay, France, Paris Saclay University, LPGP, CNRS
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Andre Anders
Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany
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Jon T Gudmundsson
Science Institute, University of Iceland, Reykjavik, Iceland, Univ of Iceland
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Daniel Lundin
Plasma and Coatings Physics Division, Linköping University, Linköping, Sweden
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Plasma Ion Doping for Semiconductor Applications
ORAL
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Presenters
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Hongwen Yan
IBM TJ Watson Research Center
Authors
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Hongwen Yan
IBM TJ Watson Research Center
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Hiro Miyazoe
IBM Research, T.J. Watson Research Center
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Marinus Hopstaken
IBM Research, T.J. Watson Research Center
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Sebastian Engelmann
IBM Research, T.J. Watson Research Center
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Takashi Ando
IBM Research, T.J. Watson Research Center
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Kevin Chan
na
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KrCl<sup>*</sup> Far UV-C Microplasma Flat Lamp: Prevention of Airborne Transmission of Pathogens with Human Safety
ORAL
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Presenters
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Sung-Jin Park
University of Illinois, Eden Park Illumination, University of Illinois at Urbana-Champai, University of Illinois
Authors
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Sung-Jin Park
University of Illinois, Eden Park Illumination, University of Illinois at Urbana-Champai, University of Illinois
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James G Eden
University of Illinois
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Water Interacting with Nanostructured Plasma Polymer Films
ORAL
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Publication: E. Bülbül, D. Hegemann, K. Ataka, S. Lehner, J. Heberle, M. Heuberger, Surf. Interfaces 23, 2021, 100922<br>D. Hegemann, E. Bülbül, B. Hanselmann, U. Schütz, M. Amberg, S. Gaiser, Plasma Process. Polym. 18, 2021, e2000176
Presenters
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Dirk Hegemann
Empa, Swiss Federal Laboratory for Mater
Authors
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Dirk Hegemann
Empa, Swiss Federal Laboratory for Mater
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Plasma enhanced chemical vapour depositon of ZrO<sub>2</sub> based layers
ORAL
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Presenters
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Philipp A Maaß
Ruhr-University Bochum, Ruhr-University bochum
Authors
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Philipp A Maaß
Ruhr-University Bochum, Ruhr-University bochum
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Vitali Bedarev
Ruhr-University Bochum
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Sebastian M. J Beer
Ruhr-University Bochum
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Marina Prenzel
Ruhr-University Bochum
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Marc Böke
Ruhr-University Bochum, Experimental Physics II, Faculty of Physics and Astronomy, Ruhr-University Bochum, Germany, 1Ruhr-University Bochum, Experimental Physics II, RUB Physik EPII; CRC 1316
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Anjana Devi
Ruhr-University Bochum
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Achim von Keudell
Ruhr-University Bochum, Experimental Physics II, Bochum
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