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Plasma Applications

FOCUS · TF12 · ID: 14059





Presentations

  • Microplasma-Driven Atomic Layer Deposition of Aluminum Oxide Etch-Free Patterning, and Gallium Oxide-Based Flexible DUV Photodetector

    ORAL

    Presenters

    • Jinhong Kim

      University of Illinois at Urbana-Champai

    Authors

    • Jinhong Kim

      University of Illinois at Urbana-Champai

    • Dane J Sievers

      University of Illinois Urbana Champaign

    • Sung-Jin Park

      University of Illinois, Eden Park Illumination, University of Illinois at Urbana-Champai, University of Illinois

    • J. Gary Eden

      University of Illinois at Urbana-Champaign

    View abstract →

  • Optimizing the deposition rate and ionized flux fraction of a high power impulse magnetron sputtering discharge

    ORAL · Invited

    Publication: M. Rudolph, N. Brenning, M. A. Raadu, H. Hajihoseini,J. T. Gudmundsson, A. Anders, and D. Lundin, Plasma Sources Science and Technology 29, 05LT01 (2020).<br>N. Brenning, A. Butler, H. Hajihoseini, M. Rudolph, M. A.Raadu, J. T. Gudmundsson, T. Minea, and D. Lundin, Journal of Vacuum Science and Technology A38, 033008 (2020).<br>N. Brenning, H. Hajihoseini, M. Rudolph, M. A. Raadu, J. T. Gudmundsson, T. M. Minea and D. Lundin, Plasma Sources Science and Technology 30, 015015 (2021).

    Presenters

    • Martin Rudolph

      Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany

    Authors

    • Martin Rudolph

      Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany

    • Nils Brenning

      KTH Royal Institute of Technology, Stockholm, Sweden

    • Hamidreza Hajihoseini

      Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands

    • Michael A Raadu

      KTH Royal Institute of Technology, Stockholm, Sweden

    • Tiberiu M Minea

      Laboratoire de Physique des Gaz et Plasmas, UMR 8578 CNRS, Université Paris–Saclay, Orsay, France, Paris Saclay University, LPGP, CNRS

    • Andre Anders

      Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany

    • Jon T Gudmundsson

      Science Institute, University of Iceland, Reykjavik, Iceland, Univ of Iceland

    • Daniel Lundin

      Plasma and Coatings Physics Division, Linköping University, Linköping, Sweden

    View abstract →

  • Plasma Ion Doping for Semiconductor Applications

    ORAL

    Presenters

    • Hongwen Yan

      IBM TJ Watson Research Center

    Authors

    • Hongwen Yan

      IBM TJ Watson Research Center

    • Hiro Miyazoe

      IBM Research, T.J. Watson Research Center

    • Marinus Hopstaken

      IBM Research, T.J. Watson Research Center

    • Sebastian Engelmann

      IBM Research, T.J. Watson Research Center

    • Takashi Ando

      IBM Research, T.J. Watson Research Center

    • Kevin Chan

      na

    View abstract →

  • Water Interacting with Nanostructured Plasma Polymer Films

    ORAL

    Publication: E. Bülbül, D. Hegemann, K. Ataka, S. Lehner, J. Heberle, M. Heuberger, Surf. Interfaces 23, 2021, 100922<br>D. Hegemann, E. Bülbül, B. Hanselmann, U. Schütz, M. Amberg, S. Gaiser, Plasma Process. Polym. 18, 2021, e2000176

    Presenters

    • Dirk Hegemann

      Empa, Swiss Federal Laboratory for Mater

    Authors

    • Dirk Hegemann

      Empa, Swiss Federal Laboratory for Mater

    View abstract →

  • Plasma enhanced chemical vapour depositon of ZrO<sub>2</sub> based layers

    ORAL

    Presenters

    • Philipp A Maaß

      Ruhr-University Bochum, Ruhr-University bochum

    Authors

    • Philipp A Maaß

      Ruhr-University Bochum, Ruhr-University bochum

    • Vitali Bedarev

      Ruhr-University Bochum

    • Sebastian M. J Beer

      Ruhr-University Bochum

    • Marina Prenzel

      Ruhr-University Bochum

    • Marc Böke

      Ruhr-University Bochum, Experimental Physics II, Faculty of Physics and Astronomy, Ruhr-University Bochum, Germany, 1Ruhr-University Bochum, Experimental Physics II, RUB Physik EPII; CRC 1316

    • Anjana Devi

      Ruhr-University Bochum

    • Achim von Keudell

      Ruhr-University Bochum, Experimental Physics II, Bochum

    View abstract →