APS Logo

Volumetric Measurements of Electric and Magnetic Field, Current, Power deposition profiles in Ar/O<sub>2</sub> Inductively Coupled Plasmas*

ORAL

Abstract

Electronegative inductively coupled plasmas (ICPs) sustained in halogen gases are used in the microelectronics industry for etching, and passivation. Pulsing is a primary control strategy to optimize conditions.  We report on time dependent measurements of electric and magnetic field, plasma current, and power deposition in pulsed ICPs sustained in tens of mTorr Ar/O2 mixtures with the oxygen being a surrogate electronegative gas.  A 3D probe drive system measures changing magnetic fields throughout the plasma volume.  Alternatively an RF compensated Langmuir probe is used to measure electron and positive ion densities and electric potential. Probe inferred densities are calibrated against a microwave interferometer. Negative ion density is inferred from spectroscopic measurements, as well from combined laser photodetachment and Langmuir probe measurements. Results are reported for varying ratios of argon to oxygen concentrations. Comparisons are made to modeling results.

–

Presenters

  • Yuchen Qian

    University of California at Los Angeles, California State University, Los Angeles, University of California, Los Angeles

Authors

  • Walter N Gekelman

    University of California at Los Angeles, University of California, Los Angeles

  • Patrick Pribyl

    University of California at Los Angeles, University of California, Los Angeles

  • Yuchen Qian

    University of California at Los Angeles, California State University, Los Angeles, University of California, Los Angeles

  • Alex Paterson

    Lam Research Corp., Lam Research Corp

  • Mark J Kushner

    University of Michigan, University of Michigan, Ann Arbor, Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, MI 48109-2122, United States of America

  • Tugba Piskin

    University of Michigan