Photoresist ashing in inductively coupled plasma with magnetic resonance wireless power transfer system

Photoresist ashing rate and uniformity is investigated in inductively coupled plasma with a magnetic resonance wireless power transfer system. An outer resonant antenna for the magnetic resonance wireless power transfer is installed at a distance of 5 cm from an inner powered antenna. When the resonance and the non-resonance are continuously changed through the switch connected to the outer resonant antenna, the profiles of plasma density and photoresist ashing rate are measured. The result is compared with the result when only powered antenna is installed and discussed along with the relevant physical mechanisms.