Plasma-surface Interactions I
ORAL · GT52 · ID: 14164
Presentations
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Multiscale simulation on plasma-surface interaction: mitigation of leakage current at high-k metal oxide interface
ORAL
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Presenters
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Byungjo Kim
Samsung Electronics Co.
Authors
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Byungjo Kim
Samsung Electronics Co.
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Muyoung Kim
Samsung Electronics Co.
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Suyoung Yoo
Samsung Electronics Co.
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Sang Ki Nam
Samsung Electronics, Samsung Mechatronics R&D center, Samsung Mechatronics R&D Center, Samsung Electronics Co.
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Ion-induced secondary electron emission coefficient of metal surfaces analysed in an ion beam experiment
ORAL
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Presenters
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Rahel Buschhaus
Experimental Physics II, Bochum
Authors
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Rahel Buschhaus
Experimental Physics II, Bochum
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Achim von Keudell
Ruhr-University Bochum, Experimental Physics II, Bochum
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Study of plasma-surface interactions of CO2-CH4 plasma on CeO2 using in situ Infrared Transmission experiments
ORAL
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Publication: N/A
Presenters
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Carolina A Garcia Soto
Laboratoire de Physique des Plasmas, Ecole Polytechnique
Authors
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Carolina A Garcia Soto
Laboratoire de Physique des Plasmas, Ecole Polytechnique
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Edmond Baratte
Laboratoire de Physique des Plasmas (LPP), CNRS, Sorbonne Université, Ecole Polytechnique Institut Polytechnique de Paris, 91128 Palaiseau France, Laboratoire de Physique des Plasmas, Ecole Polytechnique, Laboratoire de Physique des Plasmas (UMR 7648), CNRS, Univ. Paris Saclay, Sorbonne Université, École Polytechnique, France
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Vasile I Parvulescu
University of Bucharest
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Olivier Guaitella
Laboratoire de Physique des Plasmas (LPP), CNRS, Sorbonne Université, Ecole Polytechnique Institut Polytechnique de Paris, 91128 Palaiseau France, Laboratory of Plasma Physics, École Polytechnique, Laboratoire de Physique des Plasmas, Laboratoire de Physique des Plasmas, Ecole Polytechnique, Laboratoire de Physique des Plasmas (UMR 7648), CNRS, Univ. Paris Saclay, Sorbonne Université, École Polytechnique, France
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Plasma Diagnostics on an Atmospheric Pressure DC Microplasma Discharge Intended for in situ TEM Integration
ORAL
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Presenters
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Luka Hansen
Institute of Experimental and Applied Physics, Kiel University, Germany
Authors
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Luka Hansen
Institute of Experimental and Applied Physics, Kiel University, Germany
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Niklas Kohlmann
Institute of Materials Science, Kiel University, Germany
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Ulrich Schürmann
Institute of Materials Science, Kiel University, Germany
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Lorenz Kienle
Institute of Materials Science, Kiel University, Germany
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Holger Kersten
Institute of Experimental and Applied Physics, Kiel University, Germany
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From the role of Ar ions in the sputter deposition of Al films to a comprehensive surface surrogate model
ORAL
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Publication: T. Gergs, T. Mussenbrock, and J. Trieschmann, A Molecular Dynamics Study on the Role of Ar Ions in the Sputter Deposition of Al Thin Films, in preparation.<br><br>T. Gergs, and J. Trieschmann, A comprehensive surface surrogate model for sputtering processes based on conditional variational autoencoder, in preparation.
Presenters
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Tobias Gergs
Ruhr University Bochum
Authors
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Tobias Gergs
Ruhr University Bochum
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Thomas Mussenbrock
Ruhr University Bochum, Bochum University, Ruhr Univ Bochum, Ruhr-University Bochum, Germany, Ruhr-University Bochum, Ruhr University Bochum, 44780 Bochum, Germany, Ruhr University, Bochum, Germany
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Jan Trieschmann
Brandenburg University of Technology
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