Workshop III: Realistic implementation of plasma‐surface interactions in simulations of technological plasmas
INVITED · DM3
Presentations
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Introduction: Realistic Implementation of Plasma-Surface Interactions in Simulations of Technological Plasmas
COFFEE_KLATCH · Invited
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Authors
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Aranka Derzsi
Wigner Research Centre for Physics, Wigner Research Centre for Physics, Hungary
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In-situ measurement of electron emission yields at plasma-exposed surfaces
COFFEE_KLATCH · Invited
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Authors
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Mark Sobolewski
National Institute of Standards and Technology
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Computationally assisted in-situ measurement of secondary electron emission coefficients in CCPs
COFFEE_KLATCH · Invited
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Authors
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Benedek Horvath
Wigner Research Centre for Physics, West Virginia University, Ruhr-University Bochum, Dalian University of Technology, Wigner Research Centre for Physics; West Virginia University, Ruhr-University Bochum, Dalian University of Technology
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On the influence of surface quenching, electron emission and surface recombination on discharge properties
ORAL · Invited
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Authors
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Jon Tomas Gudmundsson
University of Iceland, Reykjavik, Iceland, University of Iceland
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2D PIC simulations of realistic plasma-surface interactions in geometrically asymmetric capacitive radio frequency discharges
COFFEE_KLATCH · Invited
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Authors
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Li Wang
Ruhr-University Bochum, Germany, Ruhr-University Bochum
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Kinetic Monte-Carlo modeling of plasma-surface interactions with realistic surfaces
COFFEE_KLATCH · Invited
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Authors
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Daniil Marinov
None
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