Plasma chemistry data and chemistry set optimisation approach for ALD/ALE modeling

Modern ALD and ALE processes are often enhanced with a plasma-assisted step allowing for gentler conditions on the surface and offering a greater variety in terms of active species in the gas phase than conventional chemical etch and deposition. However, using plasma means adding a large number of process parameters which will impact the outcome. In order to mitigate R&D risks and optimise the process conditions with regards to the production of suitable reactive species, plasma modelling can be employed. This, in turn, requires to have a thorough understanding of the plasma chemistry and the choice of species and reactions in the chemistry set used for modelling. In this presentation, we will show results of a sensitivity analysis of plasma chemistry sets for frequently used gas-mixtures such as O2, SF6, N2/H2 vs NH3 to identify key species and reactions. Furthermore, we will propose steps of assembling a plasma chemistry set from scratch and checking its self-consistency using www.quantemolDB.com.