SparkLight: PPPL's EUV Source for Next-Gen Microelectronics

At PPPL, a combination of modeling and experiment is being pursued in order to increase our understanding of the plasma physics which serves as the basis for tin-based extreme ultraviolet (EUV) lithography sources. Particle-in-cell simulations show the importance of kinetic effects for energetic ion damage, while radiation hydrodynamic simulations demonstrate how pulse-shaping could improve laser to EUV conversion efficiency. Experimentally, a combination of interferometry, spectroscopy, and Thomson scattering serve as the basis for providing a robust cross-validation capability. Validating experimental diagnostics against each other and simulations is currently underway to produce an accurate understanding of the plasma dynamics.