Advancing Capacitively Coupled RF Plasma: Magnetic Fields for Enhanced Control
ORAL
Abstract
Capacitively coupled Radio Frequency discharges find diverse applications, spanning from plasma processing of nanoscale semiconductors to ion thrusters crucial for satellite positioning. Over time, numerous techniques have emerged to enhance CCP performance, such as utilizing multiple RF frequencies, tailored waveforms to tune electron kinetics and densities in such systems. One promising approach for controlling plasma parameters involves introducing a magnetic field perpendicular to the sheath electric field. The incorporation of these magnetic fields not only impacts global plasma properties but also exerts influence on local charge particle behavior within the discharge. A cylindrical configuration employing an axisymmetric magnetic field can generate closed E×B drifts, promoting a uniform plasma density. Hence, a novel CCP discharge with an axial magnetic field is developed. The experimental results predict a transition in the discharge asymmetry for a constant discharge power and gas pressure. A range of magnetic fields is observed where the discharge is highly efficient with lower electron temperature. The behavior is attributed to the transition from geometrical asymmetry to magnetic field-associated symmetry. This source can be utilized for the volume production of negative ions due to its unique feature of spatial variation in the electron temperature. Hence, the potential applications of the source are also investigated by producing an oxygen discharge.
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Publication:[1] S. Dahiya, et al, "Discharge characteristics of a low-pressure geometrically asymmetric cylindrical capacitively coupled plasma with an axisymmetric magnetic field," Phys. Plasmas, vol. 30, no. 9, Sep. 2023, doi: 10.1063/5.0160506. [2] S. Dahiya, et al, "Magnetic field induced electron temperature inhomogeneity effects on discharge properties in cylindrical capacitively coupled plasmas," Phys. Lett. A, vol. 468, p. 128745, Apr. 2023, doi: 10.1016/j.physleta.2023.128745. [3] Singh, P., Dahiya, S., Pandey, A.K. and Karkari, S., 2023. Hairpin probe assisted saturation current ratio method to determine plasma electronegativity. Plasma Sources Science and Technology 32(4), p.045013
Presenters
Swati Dahiya
Institute for Plasma Research, HBNI
Authors
Swati Dahiya
Institute for Plasma Research, HBNI
Pawandeep Singh
Institute for Plasma Research
Sarveshwar Sharma
Institute for Plasma Research, A CI of Homi Bhabha National Institute, Bhat, Gandhinagar382428
Nishant Sirse
Institute of Science and Research and Centre for Scientific and Applied Research, IPS Academy, Indore-452012, India