Review: Advanced plasma modeling tools that can simulate plasmas used for semiconductor processing

INVITED · FR01 · ID: 2650443

Presentations

  • Advanced plasma modeling tools that can simulate plasmas used for semiconductor processing

    ORAL · Invited

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    Publication: References:
    [1] S. Jubin et al, Phys. Plasmas 31, 023902 (2024);
    [2] A.T. Powis, et al, Phys. Plasmas 31, 023901 (2024).
    [3] H. Sun, et al, Phys. Plasmas 30, 103509 (2023).
    [4] S. H. Son, et al, Appl. Phys. Lett. 123, 232108 (2023).
    [5] L. Xu, et al, Plasma Scie. and Technol. 32, 105012 (2023).
    [6] S. Rauf, et al, Plasma Scie. and Technol. 32, 055009 (2023).
    [7] S. Simha, Phys. Plasmas 30, 083509 (2023).
    [8] S. Sharma, Phys. Plasmas 29, 063501 (2022).
    [9] A. Verma, et al, "Study of synchronous RF pulsing in dual frequency capacitively coupled plasma" Plasma Scie. and Technol., to be published (2024).
    [10] Y. Barsukov, et al, Nanotechnology 32, 475604 (2021).
    [11] S. Jubin et al, Front. Phys. 908694 (2022)
    [12] A. Rau et al, Front. Phys. 933494 (2022).
    [13] O. D. Dwivedi, et al, J. Vac. Scie. & Technol. A 41, 052602 (2023).
    [14] S. Venturi, Phys. Plasmas 30, 043904 (2023).

    Presenters

    • Igor D Kaganovich

      Princeton Plasma Physics Laboratory

    Authors

    • Igor D Kaganovich

      Princeton Plasma Physics Laboratory

    • Dmytro Sydorenko

      Department of Physics, University of Alberta, AB, Canada

    • Andrew Tasman Powis

      Princeton Plasma Physics Laboratory, Princeton Plasma Physics Laboratory, Princeton, USA

    • Alexander V. Khrabrov

      Princeton Plasma Physics Laboratory

    • Sierra E Jubin

      Princeton University

    • Willca Villafana

      Princeton Plasma Physics Laboratory

    • Yuri Barsukov

      Princeton Plasma Physics Laboratory

    • Stephane Ethier

      PPPL, Princeton Plasma Physics Laboratory, Princeton, USA

    • Haomin Sun

      École polytechnique fédérale de Lausanne

    • Sarveshwar Sharma

      Institute for Plasma Research

    • Jian Chen

      Sun Yat-sen University, Zhuhai, China

    • Shahid Rauf

      Applied Materials

    • Sathya Swaroop Ganta

      Applied Materials Inc

    • Abhishek Verma

      Applied Materials

    • Kallol Bera

      Applied Materials

    • Liang Xu

      Soochow University, China

    View abstract →