Design and Modeling of a Microwave Plasma Enhanced Chemical Vapour Deposition System with Quartz Glass Barriers for Industrial Applications

This paper presents a microwave plasma enhanced chemical vapor deposition (MPECVD) system design featuring a 5-slot design for improved microwave coupling. Operating at 2.45 GHz, the system design and modeling use 3-D finite element method (FEM) simulations, integrating fluid dynamics, heat transfer, plasma behavior, and electromagnetic wave propagation. This comprehensive approach enhances the accuracy and reliability of microwave plasma simulations. The MPECVD system includes a coaxial waveguide and a cylindrical plasma chamber connected by five slots. A key feature of this system is the use of quartz glass barriers that separate the plasma and coaxial chambers, improving plasma stability and control. The plasma behavior is carefully modeled, considering the interactions between electric fields, heavy species transport, and drift-diffusion within a multi-physics framework. The simulations also follow the principles of mass and momentum conservations by solving the continuity and Navier-Stokes equations. With an operating power of 1 kW through a WR340 coaxial waveguide at 2.45 GHz and an argon pressure of 1 atm in the chamber, the system stabilizes the plasma density. The design supports TM₀₁₁ cavity resonance excitation of the argon plasma. The paper explores how operating parameters, particularly the critical operating density, affect the performance of the system. The MPECVD technology is pivotal in semiconductor manufacturing, nanotechnology, and materials science industries. It is widely used for the deposition of high-quality thin films, including diamond-like carbon, silicon carbide, and other advanced materials. The ability to achieve precise control over film properties makes MPECVD ideal for applications in microelectronics, solar cells, and protective coatings. This improved 5-slot design with quartz glass barriers represents a major advancement in microwave plasma coupling design, offering enhanced efficiency, stability, and control for industrial applications.