A Comparative Study Enhancing Seed Germination and Plant Growth Using Plasma in Vacuum and Plasma at Atmospheric Pressure

Two devices were used to treat watermelon and melon seeds with plasma. The first device was a Dielectric Barrier Discharge (DBD) Structure to generate non-thermal atmospheric plasma. A voltage source of 20 kV and 20kHz was applied to a structure made of stainless steel rods. The seeds to be treated were placed under the structure and were treated with plasma for an optimal of 3 minutes as previously determined. The second device used was the Plasmionique PBII300 using nitrogen gas at pressure of about 1.1E-1 Torr to create plasma. Seeds in the vacuum were treated for 3 minutes. Along with seeds that were not treated by either method all seeds were planted and their germination process was monitored. Only 80% of the seeds planted that were non-treated sprouted while those treated by plasma in vacuum had a 100% success and those treated with plasma at atmospheric pressure had a success rate of 90%. A further study testing various times for using the plasma in vacuum method showed that the optimal time for the seed treatment is 60 second. Further work comparing the treatment of seeds for 3 minutes at atmospheric pressure and 60 seconds using plasma in vacuum is being done.