A first-principles study of surface stability and H behavior near surfaces of W borides
POSTER
Abstract
Understanding the behavior of tungsten boride (WxBy) surfaces in a fusion reactor environment is necessary since WxBy may form on W divertor surfaces due to boronization treatments. The surface stability of WxBy (I41/amd-WB, P63/mmc-WB2 and I4/m-W2B) with low-index orientations, as well as hydrogen (H) energetics near WxBy surfaces has been investigated by density functional theory calculations. For single element terminated WxBy surfaces, B terminated surfaces are more stable than W terminated due to the significant reconstruction of B. The H surface adsorption energy and activation energy of H diffusion penetration below WxBy surfaces are mainly related to the outermost termination of surfaces. Specifically, the WB(001) surface terminated with two B layers, referred to as WB(001)-TBB, has higher H adsorption ability and lower H diffusion probability on the surface than other terminations, which results from the significant charge transfer from B to H. However, B atoms on the WB2(0001)-TBB surface decrease both H adsorption and diffusion abilities on the surface, but enhance H diffusion below the surface in comparison to the W terminated WB2(0001) surface. H would be trapped and diffuse within atomic surface gaps on the WB2(2-1-10) surface, while H below the surface layer would jump along the [0001] direction rather than diffuse into bulk. The surface diffusion activation energy of H on the W2B(001) surface varies only slightly with the termination. Once H crosses the surface layer of W2B(001) with either termination, H prefers to diffuse into the bulk. Correspondingly, we predict that both WB2(0001) and WB2(2-1-10) surfaces likely have higher H retention than other evaluated WxBy surfaces.
Presenters
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Li Yang
Authors
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Li Yang
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Brian D Wirth
University of Tennessee, University of Tennessee Knoxville, Department of Nuclear Engineering, University of Tennessee, Knoxville, TN 37996, USA; Fusion Energy Division, Oak Ridge National Laboratory, Oak Ridge, TN 37830, USA