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New ICRF antenna Characterization and Performance in EAST

ORAL

Abstract

Coupling and Heating associated with ion cyclotron range of frequency (ICRF) heating was a major challenge to ICRF utilization in the past on EAST. In order to increase the antenna loading and thereby increase the heating, a lower k parallel spectrum ICRF antenna has been designed and installed for EAST 2021 experimental campaign. In order to decrease the maximum voltage on the transmission line, we developed an impedance transformer near the antenna port. The new antenna with 3D curved Faraday screens and current strap is also expected to improve further the coupling. Using the old B-port antenna as a reference, the coupling and heating efficiency are significantly higher for the new antenna than the old B-port antenna. The coupling loading and heating efficiency of the new ICRF antenna is ∼3-7 times greater than the old B-port antenna. The plasma stored energy is increased by 30 kJ/MW in the high βH-mode discharges . The improved performance is consistent with simulations indicating that the new design of ICRF antenna has greatly improved the coupling relative to the old antennas. In addition, the long pulse operations of 1.1MW/60s, 1.5MW/40s and 1.8MW/22s are achieved for the new ICRF antenna in the high βH-mode discharges. Here, we will report results on the coupling characterization of new ICRF antenna and an overview of the main results from new ICRF antenna in the EAST 2021 experimental campaign. 

Presenters

  • Xinjun Zhang

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China

Authors

  • Xinjun Zhang

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China

  • Chengming Qin

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China

  • Shuai Yuan

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Hua Yang

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Yongsheng Wang

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Yuzhou Mao

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Lunan Liu

    Key Laboratory of Optoelectronic Devices and Systems, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, China

  • Lei Wang

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Yanping Zhao

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Xianzu Gong

    ASIPP, Institute of Plasma Physics, Chinese Academy of Sciences, Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China, Institute of plasma physics, Chinese Academy of Sciences

  • Yan Cheng

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Xu Deng

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Kai Zhang

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Songqing Ju

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Jianggang Li

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Baonian Wan

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China, Institute of Plasma Physics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China

  • Yuntao Song

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Wei Zhang

    Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China

  • Lin Ai

    University of Science and Technology of China, Hefei 230026, People's Republic of China

  • Qichao Liang

    University of Science and Technology of China, Hefei 230026, People's Republic of China

  • Guanghui Zhu

    Key Laboratory of Optoelectronic Devices and Systems, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, China