Target Fabrication for Pelletron Accelerator Experiments at SUNY Geneseo

Several target fabrication methods, including thermal evaporation of thin films, low energy ion implantation, and high-temperature surface diffusion, have been developed to prepare targets for experiments at the SUNY Geneseo 1.7 MV Pelletron Accelerator. A conventional high vacuum bell jar system is used to produce gold, copper, aluminum, and polyethylene thin films with thicknesses of approximately 1kÅ via thermal evaporation. Multilayer targets have been prepared for RBS depth profiling analysis using this technique. The 30-kV duoplasmatron ion source at the Low Energy Ion Facility enables ion implantation of argon in graphite and silicon substrates. A compact 1100°C tube oven is used to prepare targets with gas diffused into tantalum and other substrates by first heating the substrate under vacuum and then backfilling with the desired gas. Accelerator targets must be prepared to satisfy specific experimental requirements, and providing multiple techniques for target fabrication supports our investigations into RBS depth profiling, nuclear fusion reactions, and other accelerator-based projects.