Copper X-Pinch Characterization and Implementation as X-Ray Source for Talbot-Lau Deflectometry

ORAL

Abstract

The use of a copper X-pinch as backlighting source for Talbot-Lau X-ray Deflectometry (TXD) is presented. The TXD technique can provide information about density gradients and elemental composition in HED plasmas, through single-image x-ray refraction and attenuation. In order to test the system in pulsed power environments, a TXD was implemented using a Cu X-pinch as X-ray source in the Llamp\"{u}dke\~{n} generator (\textasciitilde 350kA in \textasciitilde 350ns). A minimum source size of \textasciitilde 50um was measured at the crossing point, with pulses of \textless 2ns; as well as an extended x-ray source from the anode side of the array. Characteristic x-rays, as well as a broad continuum under 5keV were detected. A Be object is used as probing object, measuring its density with a difference \textless 13{\%}. No damage from debris or magnetic field was observed in the gratings used for TXD, but it is shown that a protective filter is required. These results are relevant in order to adapt and design further pulsed power experiments that aim to use the Talbot-Lau technique to characterize pulsed plasmas.

Authors

  • Milenko Vescovi

    Pontif Univ Catolica de Chile

  • M. P. Valdivia

    Johns Hopkins University

  • Felipe Veloso

    Pontif Univ Catolica de Chile

  • Dan Stutman

    Johns Hopkins University

  • Mario Favre

    Pontif Univ Catolica de Chile