Developing shaped bunches to improve beam loading in laser wake-field accelerators

POSTER

Abstract

Important to successful achievement and integration of monoenergetic laser wake-field acceleration into mainstream use in science is optimization of the injection control process. In addition to low transverse emittance, a significant challenge is accelerating low energy spread beams. One such technique to improve the final energy spread of the electron beam is achievement of beam loading by way of electron bunch shaping. Optimization of bunch parameters can have a significant effect on other bunch parameters, leading to significant increases in quality of monoenergetic Wakefield produced electron beams. Presented here are studies on the production of shaped bunches by tailoring the plasma profile.

Authors

  • Andre Antoine

    University of Michigan

  • A.G.R. Thomas

    Center for Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109, Center of Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109, USA, Center for Ultrafast Optical Science, University of Michigan, University of Michigan, University of Michigan, Ann Arbor, U. of Michigan

  • Yong Ma

    Center of Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109, USA, University of Michigan, University of Michigan -Ann Arbor

  • D. Seipt

    Center of Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109, USA, University of Michigan, Center for Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109, USA