Recent Progress in Target Metrology at General Atomics

ORAL

Abstract

Targets are central to all ICF/HED programs. Many target specifications are so tight or specialized that the measurements cannot be performed on commercial equipment. General Atomics continues to provide on-demand target metrology development to support the evolving needs of the community. In this talk, we will present our latest efforts in new instrument design, equipment automation and data analysis technique development. Examples include a dark-field imaging algorithm to measure ablator defects down to 0.1um size required by Laboratory for Laser Energetics direct drive program, a full-surface wall-thickness mapper that enables polystyrene shell development, an integrated set up for GDP dome mapping and removal, an automated x-ray absorption spectroscope to improve the precision and accuracy of dopant measurement, a hohlraum interior surface inspection technique, optical transmission characterization of thin metallic films for micro-dots hohlraum diagnostic platform, new high-resolution NEXIV pin-hole array characterization, etc.

Authors

  • Haibo Huang

    General Atomics

  • Kyle Engelhorn

    General Atomics

  • Kevin Sequoia

    General Atomics

  • Kurt Boehm

    General Atomics

  • Hongwei Xu

    General Atomics

  • Javier Jaquez

    General Atomics

  • Annette Greenwood

    General Atomics

  • Jay Crippen

    General Atomics

  • Casey Kong

    General Atomics

  • Neal Rice

    General Atomics

  • Christopher Reed

    General Atomics

  • Fred Elsner

    General Atomics

  • Mike Farrell

    General Atomics