Pressure and electrical resistivity measurements on hot expanded nickel: comparisons with quantum molecular dynamics simulations and average atom approaches

POSTER

Abstract

We present experimental results on pressure and resistivity on expanded nickel at low density (0.1\,g/cm$^3$) and high temperature (1-3\,eV). These data, corresponding to the warm dense matter (WDM) regime, are used to benchmark different theoretical approaches. A comparison is presented between fully 3-dimensional quantum molecular dynamics (QMD) methods, based on density functional theory, with average atom (AA) methods, that are essentially one dimensional. In this regime the evaluation of the thermodynamic properties as well as electrical properties is difficult due to the concurrence of density and thermal effects which directly drive the metal-non-metal transition. Experimental pressures and resistivities are given in a tabular form with temperatures deduced from QMD simulations.

Authors

  • Jean Clerouin

    CEA, DAM, DIF 91297 Arpajon Cedex France

  • Charles Starrett

    CEA, DAM, DIF 91297 Arpajon Cedex France

  • Gerald Faussurier

    CEA, DAM, DIF 91297 Arpajon Cedex France

  • Christophe Blancard

    CEA, DAM, DIF 91297 Arpajon Cedex France

  • Pierre Noiret

    CEA, DAM, DIF 91297 Arpajon Cedex France

  • Patrick Renaudin

    CEA, DAM, DIF 91297 Arpajon Cedex France