A comparative study of total electron scattering cross sections of plasma processing gasses at intermediate electron energies

A comparison is made between the total electron cross sections (TCS) of Tetrafluoromethane (CF$_{4})$, Trifluoromethane (CHF$_{3})$, Hexafluoroethane (C$_{2}$F$_{6})$, and Octafluorocyclobutane (C$_{4}$F$_{8})$ available in the literature and those recently measured in this laboratory using the linear transmission technique. The present measurements are about 0-20{\%} higher than those in the literature. An empirical formula developed to predict the TCS of plasma processing gases, as a function of incident electron energy, will be presented.