e-PLAS calculation of short pulse heating in wire targets

The 2-D implicit hybrid simulation code e-PLAS has been used to model energy deposition and hot electron transport in a variety of wire targets (e.g. Cu wires with nail or cone heads) [1]. Implicit $E${\&}$B$-fields [2] permit the use of large cells and time steps while avoiding finite grid heating. Van Leer background plasma fluids allow for ps-long simulations of $\sim $700 $\mu $m wires on a PC with economy. For $\sim $1.7x10$^{20}$ W/cm$^{2}$ pulse intensities we compare results from the use of Cartesian and cylindrical modeling geometry. We probe the effects of cold background electron-ion scatter [3], resistive $E-$fields and hot electron drag on the background heating. Temperature limitation from target ionization is explored. $B-$field trapping of hot electrons generated near critical density is examined as a function of the emission isotropy, energy spectrum, and plasma gradient scale length. Integrated simulations of the absorption and hot electron generation will be discussed. [1] J. Pasley et al., Phys. Plas. \textbf{14,} 120701 (2007). [2] R. J. Mason, J. Comp. Phys.\textbf{ 71,} 429 (1987). [3] R. J. Mason, Phys. Rev. Lett. \textbf{96, } 035001 (2006).