Optimization of Extreme Ultra-Violet Emission from Laser-produced Tin Plasmas by Radiation Hydrodynamic Simulations

ORAL

Abstract

Extreme Ultra-Violet (EUV) emission from laser-produced tin plasmas is a candidate for the light source used in lithography of the next generation semi-conductors. In order to simulate the EUV emission from laser-produced tin plasma, we have developed the radiation hydrodynamic code ``Star-1D'' and ``Star-2D,'' respectively. The calculated x-ray spectrum and EUV conversion efficiency from 1-D simulations qualitatively agree with experimental results. Calculated spectrum by 2-D code for the long scale length plasma is good agreement with experimentally measured results. Also, calculated density profiles are verified by the interferometry observations. We will show the optimized conditions and its physical interpretation for the high conversion efficiency and high power EUV light source.

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Authors

  • Atsushi Sunahara

    ILT, ILE, Osaka University, Institute for Laser Technology Japan

  • Akira Sasaki

    Japan Atomic Energy Agency

  • Katsunobu Nishihara

    Osaka University, Institute of Laser Engineering, Osaka University, Institute of Laser Engineering Osaka University

  • Hirofumi Ueda

    Institute of Laser Engineering Osaka University

  • Tatsuya Aota

    Institute of Laser Engineering Osaka University

  • Shinsuke Fujioka

    ILE, Osaka U., Osaka Univ., ILE, Osaka Univ., ILE, Osaka University, Institute of Laser Engineering, Osaka University, Japan, Institute of Laser Engineering Osaka University

  • Michiteru Yamaura

    Institute for Laser Technology Japan

  • Yoshinori Shimada

    Institute for Laser Technology Japan

  • Hiroaki Nishimura

    ILE, Osaka U., Osaka Univ., ILE, Osaka Univ., ILE, Osaka University, Institute of Laser Engineering Osaka University

  • Noriaki Miyanaga

    Institute of Laser Engineering Osaka University

  • Yasukazu Izawa

    Institute of Laser Engineering Osaka University

  • Kunioki Mima

    ILE, Osaka U., Osaka Univ., ILE, Osaka Univ., ILE, Osaka University, Institute of Laser Engineering, Osaka Univ., Institute of Laser Engineering Osaka University