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Numerical simulation of wax deposition in gas-liquid flow complemented by a thin film model

ORAL

Abstract

A methodology is developed for simulation of wax deposition in industrial devices, with a coupled solution of the bulk flow and a thin film model. The versatility and simplicity of the model allow for simulation of phenomena in a large range of timescales, with the possible presence of multiple phases, complex geometries or other phenomena. The model is implemented in OpenFOAM, and validated with experimental measurements of deposit thickness for single-phase and two-phase flows from the literature. A one-dimensional formulation is also implemented in a general-purpose multiphase transient pipe simulator, applicable to industrial conditions.

Presenters

  • Gabriel Goncalves

    Imperial College London

Authors

  • Gabriel Goncalves

    Imperial College London

  • Omar K Matar

    Imperial College London, Department of Chemical Engineering, Imperial College London, South Kensington Campus, London SW7 2AZ, UK