Optical Properties of Inductively RF Discharge for Argon (Ar)

Different power supplies in laboratories can produce plasma, which is the fourth state of matter. In this study, the inductively radio frequency (RF) plasma of Ar at low pressure in the quartz glass reactor prepared for special design is obtained. Discharge properties of the generated plasma are examined with optical emission spectroscopy (OES). For RF power values, Ar was sent in certain periods and amounts to reactor in which were obtained the low pressure with vacuum pump. Plasma was generated and the data obtained from OES were composed for calculating of electron temperature. In this way, the electron transitions can also be investigated from data. In the presence of experimental data, the collisional radiative model can be used to obtain of the electron temperature. In addition, the various graphs of the plasma parameters are showed.