Diffraction gratings for atom cooling produced by direct laser writing
ORAL
Abstract
We report the use of a direct laser-writing process to fabricate a 2D diffraction grating that can form a magneto-optical trap from a single laser beam. This approach significantly speeds up the fabrication process of these gratings compared to the conventionally used electron-beam lithography approach [1]. We also discuss the effects of imperfect suppression of higher-order diffractions — arising from the resolution limits of the direct laser writer — on the trapping and cooling region of the MOT.
[1] A surface-patterned chip as a strong source of
ultracold atoms for quantum technologies, C. C. Nshii1, M. Vangeleyn1, J. P. Cotter2, P. F. Griffin, E. A. Hinds, C. N. Ironside, P. See, A. G. Sinclair, E. Riis and A. S. Arnold
[1] A surface-patterned chip as a strong source of
ultracold atoms for quantum technologies, C. C. Nshii1, M. Vangeleyn1, J. P. Cotter2, P. F. Griffin, E. A. Hinds, C. N. Ironside, P. See, A. G. Sinclair, E. Riis and A. S. Arnold
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Publication: Massive production of diffraction gratings for atom cooling ----ongoing
Presenters
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Yujia Yuan
University of Waterloo
Authors
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Yujia Yuan
University of Waterloo
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Paul Anderson
University of Waterloo
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Sreesh Venuturumilli
University of Waterloo, Institute for Quantum Computing
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Rubayet Al Maruf
University of Waterloo, Institute for Quantum Computing
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Behrooz Semnani
University of Waterloo, Institute for Quantum Computing
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Michal Bajcsy
University of Waterloo, Institute for Quantum Computing