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A Compact 0.7 T Electron Beam Ion Trap Using Radial NdFeB Magnets

POSTER

Abstract

The study of multiply-ionized atoms has been greatly facilitated by the invention of the electron beam ion trap (EBIT), a device developed in the late 1980s1 for the effective production and trapping of highly-charged ions (HCIs). To produce very high charge states, an EBIT typically uses a superconducting magnet to intensify the electron beam, a costly setup to build and operate. In recent years, rare-earth permanent magnets have been used to build compact, room-temperature EBITs that are better suited for atomic clock research and other applications requiring ions with low ionization thresholds. Based on early efforts2 at NIST, a prototype miniaturized EBIT3 employed a pair of axially-magnetized NdFeB rings yoked by drift tubes of soft iron to produce a peak field of 290 mT at the trap center, demonstrating production of various highly charged ions such as Ne8+, Ar9+, Ar13+, Kr17+ and other species of HCIs with ionization potential up to 900 eV. The current work seeks to improve the performance of such miniaturized devices as sources of multiply-charged ions in the mid-Z and mid-q regime which can be extracted and subsequently recaptured for spectroscopy measurements. Simulations reveal that high electron current density and beam transmission through a permanent magnet structure4 with a peak field of 700 mT is attainable by embedding three pairs of radial ring magnets within the two end-cap drift tubes using appropriate materials.

1M. A. Levine, et al, Physica Scripta Volume T 22, 157-163 (1988)

2S. F. Hoogerhide, et al, Atoms 3, 367-391 (2015)

3A Miniaturized Dual-Anode Electron Beam Ion Trap Using Rare-Earth Magnets, A. S. Naing, E. B. Norrgard, B. C. Foo, and J. N. Tan, (to be published)

4A mini-EBIT for Studying Highly Charged Ions with Low Ionization Threshold, A. S. Naing, et al, at the 2nd North American Conference on Trapped Ions (NACTI), University of Maryland, College Park, MD USA

Presenters

  • David La Mantia

    Clemson University, National Institute of Standards and Technology, Clemson University, National Institute of Standards & Technology

Authors

  • David La Mantia

    Clemson University, National Institute of Standards and Technology, Clemson University, National Institute of Standards & Technology

  • Aung S Naing

    University of Delaware, National Institute of Standards and Technology, University of Delaware, National Institute of Standards & Technology, University of Delaware, National Institute of Standards and Technology, Gaithersburg, MD, National Institute of Standards and Technology, Gaithersburg, MD 20899

  • Joseph Tan

    National Institute of Standards and Technology, National Institute of Standards & Technology, National Institute of Standards and Technology, Gaithersburg, MD, National Institute of Standards and Technology, Gaithersburg, MD 20899