Adsorption and desorption mechanisms for allylamine, propylamine, propylchloride, and propylene on the Si(100)-2x1 surface

ORAL

Abstract

The mechanisms for adsorption and desorption of allylamine, propylamine, propylchloride, and propylene on the Si(100)-2x1 surface has been investigated experimentally using thermal desorption spectroscopy (TDS) and computationally using density functional theory (DFT) calculations. TDS was carried out to track down possible desorption products and their desorption temperatures and DFT calculations were done to help elucidate the experimental results, and to more fully probe mechanistic pathways consistent with the TDS results. All of these molecules are three carbon chain moieties with differing terminal functional groups and were chosen to self-consistently probe amine and alkene functional group chemistry on this surface. Results from the adsorption of propylene and allylamine were mostly consistent with previous studies on adsorption of these molecules, with the main difference being the observation of a prominent $m/z$ = 17 desorption product in the case of TDS after allylamine adsorption. TDS after propylamine and allylamine adsorption gave rise to a prominent propylene ($m/z$ = 42) desorption channel. The TDS results showed that propylene and halo-alkanes such as chloro-propane also display a propylene desorption channel, but it appears at a lower surface temperature than for the amines. This is an indication that the amine adsorption and decomposition mechanisms is different than halo-alkane or alkene reaction on the Si(100)-2x1 surface, in that it does not involve any silicon-carbon bond forming reactions initially. This is consistent with the computational results as well.

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Authors

  • Lekh Adhikari

    University of Nevada, Reno

  • G.V. Brown

    Department of Physics at CSU, Fresno, Lawrence Livermore National Laboratory, Stanford University, Advanced Light Source, Lawrence Berkeley National Lab, Nanoelectronics Research Institute, Japan Atomic Energy Agency, University of Tokyo, Cornell University, Tokyo Institute of Technology, Suranaree University of Technology, Shandong University, Stanford Synchrotron Radiation Lightsource, UC Davis, CSU Dominguez Hills, Thomas Jefferson National Accelerator Facility, UC Berkeley, ANL, UChicago/ANL, UManitoba, Northwestern U/ANL, LLNL, UCB/LLNL, McGill U, McGill U/ANL, University of Nevada, Reno, Hitachi Global Storage Technology, Advanced Light Source, Stanford Synchrotron Radiation Laboratory, Stanford Synchrotron Radiation Lightsource, SLAC National Accelerator Laboratory, Materials Science and Engineering, Stanford University, Radiation Oncology, Stanford University School of Medicine, Missouri University of Science and Technology, International Institute of Physics, University of Missouri, University of Notre Dame du Lac, Department of Physics, California State University, Fresno, California, California State University Long Beach, BNL, IWF Dresden, Department of Physics, University of California, Davis, CA 95616, USA, University of California, Merced, Laboratoire Univers et Particules de Montpellier, IN2P3 (France), SLAC National Accelerator Laboratory/Stanford University/KIPAC, University of Perugia, University of Washington, CEA/Saclay, UNR, UNM, UCSD, RAL, ILE, MIT, LANL, LLE, NRL, SLAC National Accelerator Laboratory, Technische Universitaet Berlin, Max Born Institut, Hiroshima University, Western Michigan University, MPIK