Measuring Quasiparticle Diffusion in Superconducting Aluminum Films with a TES and Microscopic Laser-Scanning Technique
ORAL
Abstract
We present preliminary data from a laser-scanning microscopy-based technique for measuring 100µm-scale quasiparticle (QP) diffusion in superconducting Al films. QP are produced at a localized origin in the Al film using a focused 1550nm laser coupled to a single-mode optical fiber mounted on piezoelectric nanopositioners. The resulting QP propagation can then be monitored using a transition edge sensor (TES), and described using a simple diffusion model.
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Presenters
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David Z Osterman
University of Massachusetts Amherst
Authors
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David Z Osterman
University of Massachusetts Amherst
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Dafei Jin
University of Notre Dame
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Xu Han
Argonne National Laboratory
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Xinhao Li
Argonne National Laboratory
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Xianjing Zhou
Argonne National Laboratory
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Yizhong Huang
University of Chicago