A new standard for complex permittivity

ORAL · Invited

Abstract

The semiconductor industry needs complex permittivity standards traceable to the International System of Units (SI). SI-traceable standards provide a known 'right' answer to enable industry labs to accept new materials, validate measurement systems, and qualify internal measurement capabilities. Today, no such complex permittivity standards exist. The International Electronics Manufacturing Initiative (iNEMI) identified this problem and launched a project co-chaired by Nathan D. Orloff at the National Institute of Standards and Technology (NIST) to develop a standard for complex permittivity from 10 GHz – 110 GHz. My doctoral research is to develop of this complex permittivity standard and lead international intercomparisons with 9 members from industry (e.g., Intel, Nokia, Panasonic, 3M, etc.) and national research laboratories (e.g., NIST, ITRI, etc.). These intercomparisons inform the development of prototype standard reference materials, demonstrate reproducibility among labs, and obtain stakeholder feedback to develop a useful industrial tool. In the following, I describe my research to develop new electromagnetic theory, prototype standard reference materials, perform electrical measurements, coordinate traceable dimensional measurements, and organize prototype testing.

Presenters

  • Lucas Enright

    National Institute of Standards and Technology

Authors

  • Lucas Enright

    National Institute of Standards and Technology

  • Benjamin Jamroz

    National Institute of Standards and Technology

  • Geoff Brennecka

    Colorado School of Mines

  • Nathan D Orloff

    National Institute of Standards and Technology